The importance of photoresists in microelectronic industry is described in this review,emphasizing the characteristics of polysilane photoresists and the developing situation of ultra violet, deep ultraviolet, X-ray,electron-beam polysilane photoresists etc.

Polysilynes, a new kind of high-performance materials, are reviewed on the present investigation of their synthesis, structure, reactions and applications as semiconductors, conductive SiC thin films, optical waveguides and photoresists.

Preparation of Cresol-formaldehyde Resins Used for Making Positive Photoresist;

Research progress and application status of UV positive photoresist;

Experiments on two-photon Optical storage in photoresist;