1.
resist patterning step
光致抗蚀图形成工序
2.
photoresist mask pattern
光致抗蚀剂掩模图形
3.
Electron-beam lithography with a novel multilevel resist structure defines the pattern.
采用新型的多层抗蚀剂结构的电子束光刻来形成图形。
4.
The synthesis and properties of a new dissolution inhibitor for 193nm photoresist
193nm光致抗蚀剂用新型阻溶剂的合成及性能研究
5.
The composition and characteristic of liquid photo imageable etching resist ink is introduced briefly, and the perfect blueprint is also described in this paper.
综述了液态光致抗蚀油墨的组成、特性及其诱人的发展前景。
6.
Epoxy Resin Modified Hyperbranched Polyesters-Synthesis, Properties and Application for Photoresist;
环氧树脂改性超支化聚酯的合成、性能及光致抗蚀剂应用
7.
trench mask definition
槽腐蚀用掩模图象形成
8.
Specification for photoresist/E-beam resist for hard surface photoplates
GB/T16527-1996硬面感光板中光致抗蚀剂和电子束抗蚀剂规范
9.
Polymer Light-Emitting Diodes Based on Erosion-Resistant HTLs
基于抗侵蚀空穴传输层的聚合物电致发光器件
10.
Corrosion Behavior of Ni-Cr PFM Alloy Fabricated by Laser Rapid Forming Technology
激光快速成形镍铬烤瓷合金腐蚀性能研究
11.
Experiment method on mechanism of thrust of laser-induced ablation propulsion with liquid propellant
液体烧蚀激光推进推力形成机理实验方法
12.
fine featured resist
精细结构光刻用抗蚀剂
13.
An image of the patterns on the mask is projected onto the resist-coated wafer, which is many centimeters away.
掩膜板上图形的像被投影到许多厘米以外的涂有抗蚀剂的片子上。
14.
Nonlinear ionization enhanced color center formation.
光致色心的形成与非线性电离有关。
15.
The research of anti-tarnishment of silver antiques treated with corrosion inhibitors under light exposure test;
银器文物缓蚀处理抗光照腐蚀的研究
16.
It is exposed to strong light through a gravure screen to produce what will be used as a resist for etching the gravure plate or cylinder.
用强光经凹版网片在它上面曝光，造成抗蚀表面；在腐蚀版片或圆筒时用。
17.
Due to the formation of low melting calcium-aluminates the corrosion resistance and hot erosion strength are reduced.
由于低熔点的铝酸钙的形成，火砖的抗腐蚀能力和抗热蚀强度降低了。
18.
The Investigation to the Formation of Holographic Grating in Photopolymers;
光致聚合物中全息光栅形成的机理研究