1.
photoresist mask pattern
光致抗蚀剂掩模图形
2.
resist patterning step
光致抗蚀图形成工序
3.
trench mask definition
槽腐蚀用掩模图象形成
4.
An image of the patterns on the mask is projected onto the resist-coated wafer, which is many centimeters away.
掩膜板上图形的像被投影到许多厘米以外的涂有抗蚀剂的片子上。
5.
Electron-beam lithography with a novel multilevel resist structure defines the pattern.
采用新型的多层抗蚀剂结构的电子束光刻来形成图形。
6.
Specification for photoresist/E-beam resist for hard surface photoplates
GB/T16527-1996硬面感光板中光致抗蚀剂和电子束抗蚀剂规范
7.
The synthesis and properties of a new dissolution inhibitor for 193nm photoresist
193nm光致抗蚀剂用新型阻溶剂的合成及性能研究
8.
Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography
优化掩模分布改善数字光刻图形轮廓
9.
fine featured resist
精细结构光刻用抗蚀剂
10.
COMPUTER SIMULATION OF EFFECTS OF PHASE-SHIFT MASK ON AERIAL IMAGE INTENSITY PROFILE OF PHOTOLITHOGRAPHIC PATTERN
相移掩模对曝光图形空间像光强分布影响的计算机模拟
11.
Epoxy Resin Modified Hyperbranched Polyesters-Synthesis, Properties and Application for Photoresist;
环氧树脂改性超支化聚酯的合成、性能及光致抗蚀剂应用
12.
photoresist controlled etch
光刻胶掩蔽控制腐蚀
13.
Specification for round quartz photomask substrates
GB/T16523-1996圆形石英玻璃光掩模基板规范
14.
Fabrication and Characterization of General Microcups with Flexibility and Solvent-resistance by UV Photo-mask Lithography
掩膜光刻法制备柔性抗蚀电子纸微杯及其性能表征
15.
masking clean / etch statio
掩模板清洗[腐蚀]台
16.
Multilayer Dielectric Gratings: In-situ Monitoring of Duty Cycle of photoresist Mask and Ion-Beam-Etched Groove Depth;
介质膜光栅：光刻胶掩模占宽比和离子束刻蚀槽深的监控
17.
Profile Control and Detection of Holographically Recorded Photoresist Grating Masks;
光刻胶全息光栅掩模槽形的控制和检测
18.
Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;
极紫外光刻掩模热变形及其对光刻性能的影响