1) photoresist
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液态光致抗蚀剂
1.
The phototsensitive properties of photoresist with the dierrent hydrogen donors and photoinitiator dosage were studied by real time IR.
通过实时红外光谱研究了供氢体种类、复合引发剂用量对光致抗蚀剂感光性能的影响,并用该复合引发体系替代传统的907/ITX光引发体系制备线路板用液态光致抗蚀剂中,研究结果表明BCIM、EMK、NPG复合光引发体系效果比传统907/ITX光引发体系有提高,所得线路板成像边缘更光滑。
2) Photoresists
光致抗蚀剂
1.
The importance of photoresists in microelectronic industry is described in this review,emphasizing the characteristics of polysilane photoresists and the developing situation of ultra violet, deep ultraviolet, X-ray,electron-beam polysilane photoresists etc.
概述了光致抗蚀剂在微电子工业中的作用,着重介绍了聚硅烷光致抗蚀剂的特点,以及聚硅烷紫外、深紫外、X射线、电子未等抗蚀剂的发展状
2.
Polysilynes, a new kind of high-performance materials, are reviewed on the present investigation of their synthesis, structure, reactions and applications as semiconductors, conductive SiC thin films, optical waveguides and photoresists.
本文综述了一类新型的高功能材料——聚硅炔的合成、结构、反应以及作为半导体、导电性SiC薄膜、光学波导器和光致抗蚀剂的应用的研究现状。
3) photoresist
[,fəutəuri'zist]
光致抗蚀剂
1.
Preparation of Cresol-formaldehyde Resins Used for Making Positive Photoresist;
正性光致抗蚀剂用酚醛树脂的制备
2.
Research progress and application status of UV positive photoresist;
紫外正性光致抗蚀剂的研究进展及应用现状
3.
Experiments on two-photon Optical storage in photoresist;
以光致抗蚀剂为记录介质的双光子存储实验
4) liquid photo imageable etching resist ink
液态光致抗蚀油墨
1.
With the development of Printed Circuit Board (PCB),liquid photo imageable etching resist ink has become the prime process technology of the fine line graph facture.
随着印制电路板 (PCB)行业的飞速发展 ,液态光致抗蚀油墨已逐渐成为精细导线图形制作的主要方法。
2.
With the development of Printed Circuit Board (PCB),liquid photo imageable etching resist ink had become the prime process technology of the fine line graph facture.
随着印制电路板 (PCB)行业的飞速发展 ,液态光致抗蚀油墨已逐渐成为精细导线图形制作的主要方法 。
5) positive photoresist
正型光致抗蚀剂
1.
This paper focuses on the positive photoresist’s application performance influence that the graft matrix and 2,1,5-sulfonylchloride(2-azo-1-naphthoquinone-5-sulfonyl chloride)(NDQ),which are used for composing LCD positive photoresist sensitive resin(PAC).
本文研究了液晶显示器件(LCD)正型光致抗蚀剂用感光树脂(PAC)所需接枝母体和2,1,5-重氮萘醌磺酰氯(NDQ)对正型光致抗蚀剂应用性能的影响。
6) UV photoresist
紫外光致抗蚀剂
1.
So,the article introduces several important UV photoresists and their development in recent years.
本文介绍了近年来几种主要的紫外光致抗蚀剂及其研究进展,对ArF激基体激光(193nm)光致抗蚀剂的各个组分进行了归纳综述。
补充资料：干膜光致抗蚀剂
分子式：
CAS号：
性质： 将无溶剂型光致抗蚀剂涂在涤纶片基上，再覆上聚乙烯薄膜。使用时揭去聚乙烯薄膜，把干胶层压在版基上，经曝光显影处理，即可形成图像。主要是利用多官能团的丙烯酸酯类单体或带双键的丙烯酸酯光敏树脂在光引发剂存在下，由光引发聚合反应产生交联结构而达到成像目的。多用于印刷线路板等的生产。
CAS号：
性质： 将无溶剂型光致抗蚀剂涂在涤纶片基上，再覆上聚乙烯薄膜。使用时揭去聚乙烯薄膜，把干胶层压在版基上，经曝光显影处理，即可形成图像。主要是利用多官能团的丙烯酸酯类单体或带双键的丙烯酸酯光敏树脂在光引发剂存在下，由光引发聚合反应产生交联结构而达到成像目的。多用于印刷线路板等的生产。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条