1.
resist patterning step
光致抗蚀图形成工序
2.
photoresist mask pattern
光致抗蚀剂掩模图形
3.
Electron-beam lithography with a novel multilevel resist structure defines the pattern.
采用新型的多层抗蚀剂结构的电子束光刻来形成图形。
4.
The synthesis and properties of a new dissolution inhibitor for 193nm photoresist
193nm光致抗蚀剂用新型阻溶剂的合成及性能研究
5.
The composition and characteristic of liquid photo imageable etching resist ink is introduced briefly, and the perfect blueprint is also described in this paper.
综述了液态光致抗蚀油墨的组成、特性及其诱人的发展前景。
6.
Epoxy Resin Modified Hyperbranched Polyesters-Synthesis, Properties and Application for Photoresist;
环氧树脂改性超支化聚酯的合成、性能及光致抗蚀剂应用
7.
trench mask definition
槽腐蚀用掩模图象形成
8.
Specification for photoresist/E-beam resist for hard surface photoplates
GB/T16527-1996硬面感光板中光致抗蚀剂和电子束抗蚀剂规范
9.
Polymer Light-Emitting Diodes Based on Erosion-Resistant HTLs
基于抗侵蚀空穴传输层的聚合物电致发光器件
10.
Chining and embossing operations particularly require heavy pressures in order to force the metal into the design on the face of the tools.
压花、压币工序特别需要高压来强使金属形成工具面的图形。
11.
Research of Repairing the Abraded Shafts of MB40 Filter Using Laser Processing Technology;
抗碱蚀抗磨损激光修复碱过滤器工艺研究
12.
A Sprouting Graph Based Approach to Dynamic Check the Temporal Consistency of Workflow Multi-Process
基于生成图的工作流多过程动态时序一致性验证方法
13.
graphics generator
图形发生器图形生成程序
14.
A user selects a rectangle from the graphics palette, and the cursor then becomes a modal rectangle tool charged with exactly one rectangle.
用户从图形工具栏中选择一个矩形，光标就变成了负载一个矩形实例的矩形模态工具。
15.
The resolution of an etching process is a measure of the fidelity of pattern transfer.
刻蚀工艺的分辨率是图形转移保真度的量度。
16.
2 Activity Sequencing-identifying and documenting interactivity dependencies.
工序排序－确定工序之间的依赖关系，并形成文件。
17.
Activity Sequencing- identifying and documenting interactivity dependencies.
工序排序－定工序之间的依赖关系，并形成文件。
18.
Corrosion Behavior of Ni-Cr PFM Alloy Fabricated by Laser Rapid Forming Technology
激光快速成形镍铬烤瓷合金腐蚀性能研究