1) projection photolithography
投影光刻法
2) Projection lithography
投影光刻
1.
Soft X-ray projection lithography technology;
软X射线投影光刻技术及其发展
2.
Design of diffractive optical elements for off-axis illumination in projection lithography;
投影光刻离轴照明用衍射光学元件设计
3.
Soft X-ray projection lithography is expected as a candidate for VLSI p roduction in the near future.
软 X射线投影光刻作为特征线宽小于 0 。
3) Stepper
[英]['stepə] [美]['stɛpɚ]
投影光刻机
1.
The Key Craftwork and Technique of Assembling and Adjusting of Projective Lens of Stepper;
投影光刻机镜头的装校关键工艺与技术
4) 193 nm projection lithography
193nm投影光刻
5) laser projection lithography
激光投影光刻
1.
Design of fold laser projection lithography lens;
折叠式激光投影光刻物镜的设计研究
2.
For the laser projection lithography system used for the production of large-area,high processing throughput,and cost-effective printed circuit boards(PCB),its illumination system is simulation-designed and optimized using ZEMAX optical design software,and the optimized results are analyzed.
针对大面积、高产量和节约型印制电路板(PCB)生产使用的激光投影光刻机,利用ZEMAX工程光学设计软件,对其照明系统进行了模拟设计与优化,并对优化后的结果进行了分析。
6) EUVL
极紫外投影光刻
1.
To study the two-mirror reduced projection optics for Extreme Ultraviolet Lithography (EUVL), Schwarzschild design form and flat field design form were investigated.
极紫外投影光刻(EUVL)两镜微缩投影物镜通常采用Schwarzschild结构和平场结构。
2.
Some problems were brought from the short wavelength of EUVL.
针对极紫外投影光刻 ( Extreme Ultraviolet Lithography,简称 EUVL)工作波长短的特点及由此带来的一些问题 ,对 EUVL微缩投影物镜的结构参数进行分析选择 ,设计了离轴照明方式的 Schwarzschild微缩投影成像物镜。
3.
A laser-produced plasma(LPP) source with liquid aerosol spray target and nanosecond laser was developed,based on both soft X-ray radiation metrology and extreme ultraviolet projection lithography(EUVL).
基于软X射线辐射计量和极紫外投影光刻(EUVL)应用,研制了一台使用纳秒激光器的液体微滴喷射靶激光等离子体(LPP)极紫外光源。
补充资料：投影光刻
分子式：
CAS号：
性质：一种把图像投影在光敏材料上的方法。它可免于光学掩模版和光敏材料涂层的接触。
CAS号：
性质：一种把图像投影在光敏材料上的方法。它可免于光学掩模版和光敏材料涂层的接触。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条