1.
Investigation on Extreme Ultraviolet Lithography;
极紫外投影光刻中若干关键技术研究
2.
Two-mirror system design study of reduced projection optics for EUV Lithography;
极紫外投影光刻两镜微缩投影系统的光学设计
3.
Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;
极紫外光刻掩模热变形及其对光刻性能的影响
4.
Research on Precise Mechanism and Related Control Technologies of Euvl Stage;
极紫外光刻机工件台精密机械及控制相关技术
5.
deep uv projection aligner
远紫外线投影曝光对准器
6.
Research of SU-8 Resist Lithography Using Ultraviolet Laser;
紫外激光曝光光刻SU-8胶的工艺研究
7.
Effect of proton irradiation on transmittance of Al filter at EUV waveband
质子辐照对极紫外波段滤光片透过率的影响
8.
Research of Focus Optical System Used in Ultraviolet Photolithography;
用于紫外光刻的聚焦光学系统的研究
9.
Study on Key Technologies in UV-LED Fiber Lithography System
紫外LED光纤光刻系统关键技术研究
10.
Development of a High ThermoStability UV Positive Photoresist and a 248nm Deep-UV Photoresist;
耐高温紫外正型光刻胶和248nm深紫外光刻胶的研制
11.
Research on Theory and Experiment of UV-Lithography on SU-8 Photoresist;
SU-8胶紫外光刻理论与实验研究
12.
Study of a UV Positive Photoresist and Photoacid Generators for 248nm Deep-UV Photoresist;
紫外正型光刻胶及248nm产酸剂的研制
13.
Optical head supporting sub wavelength structure with UV interference lithography
支持亚波长结构光刻的紫外干涉光学头
14.
Numerical analysis and measurement of stray light from UV ruled gratings
紫外平面刻划光栅杂散光数值分析及测试
15.
silicon photodiode vacuum ultraviolet detector
硅光电二极管真空紫外探测器
16.
The Optical Characteristic Studies of Space EUV Solar Telescope;
空间极紫外太阳望远镜光学性能研究
17.
Measure and Analysis of Discharge Produced Plasma EUV Spectrum
放电等离子体极紫外光谱测量及分析
18.
Influence of UV Illumination on Fluorescence Spectrum Properties of Azobenzen
紫外光辐照对偶氮苯光谱特性的影响