1.
Two-mirror system design study of reduced projection optics for EUV Lithography;
极紫外投影光刻两镜微缩投影系统的光学设计
2.
The research results show that IIL can get the high resolution more effectively than conventional optical lithography (OL).
研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。
3.
Investigation on Extreme Ultraviolet Lithography;
极紫外投影光刻中若干关键技术研究
4.
Design and Analysis of an Alignment System for the Large-area Scan-and-repeat Projection Lithography
大面积循环扫描投影光刻对准系统设计和分析
5.
Her eyes flashed to her daughter.
她的眼光立刻投向女儿。
6.
Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;
极紫外光刻掩模热变形及其对光刻性能的影响
7.
Schmidt projection optics
施密特光学投影系统
8.
reduction aligner
收缩式投影曝光装置
9.
one to one projection system
一比一投影曝光装置
10.
CRT-photo chromatic film projectio
光变色膜显像管投影
11.
projection stepper
步进式投影曝光装置
12.
electron beam projection exposure apparatus
电子束投影曝光装置
13.
optical orthophotoscope
光学正射投影纠正仪
14.
optical-mechanical projection system
光学－机械投影系统
15.
optical dividing head with projection readout
光学投影读数分度头
16.
optidress projector scope
光学修正投影显示器
17.
cool beam low volatage electronic projective lamp
冷光束低压电子投影灯
18.
ozone induced scumming
臭氧感生未显影光刻胶形成