1) sputtering voltage
溅射电压
2) sputtering pressure
溅射气压
1.
Effect of sputtering pressure on the microstructure and anisotropic magnet-resistance of Ni80Fe20 thin films;
溅射气压对Ni_(80)Fe_(20)薄膜微结构和各向异性磁电阻的影响
2.
Effects of sputtering pressure on electrical and optical properties of transparent conducting ZnO thin film
溅射气压对ZnO透明导电薄膜光电性能的影响
3.
Effects of sputtering conditions,such as substrate temperature and sputtering pressure,on the AMR of Ni80Fe20 thin films prepared by magnetron sputtering have been investigated.
研究了基片温度和溅射气压对磁控溅射方法制备的Ni80Fe20磁性薄膜各向异性磁电阻的影响。
3) sputtering bias-voltage
溅射偏压
1.
The effects of substrate temperature and sputtering bias-voltage on film stru.
并研究了溅射偏压对有机衬底 ZnO:Al 薄膜结构及光电特性影响,最佳负偏压为 60 V。
4) bias sputtering
偏压溅射
5) sputtered electrode
溅射电极
补充资料：标准操作冲击电压波形(见冲击电压发生器)
标准操作冲击电压波形(见冲击电压发生器)
standard switching impulse voltage waveform
b .oozhun CooZuo ChongJld，onyo boxlng标准操作冲击电压波形(standard switchingimpulse voltage waveform)见冲击电压发生器。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条