1.
The Effect of Air Pressure on the Growth,Crystallization and Photoluminescence of ZnO Films
溅射气压对ZnO薄膜生长、发光性能和结构的影响
2.
Effects of sputtering pressure on electrical and optical properties of transparent conducting ZnO thin film
溅射气压对ZnO透明导电薄膜光电性能的影响
3.
We found that sputtering pressure and sputtering time determine the deposition rate and thickness of the A1 film, respectively.
溅射气压和时间分别影响铝层在氟塑料表面的沉积速率和生长厚度。
4.
Dependence of Argon Gas Pressure on Properties of Ga Doped ZnO Films Deposited by RF Sputtering
氩气压强对溅射法制备Ga掺杂ZnO薄膜性能的影响
5.
The structural and optical properties of ZnO films
沉积气压对磁控溅射制备ZnO薄膜的结构与光学性能影响
6.
low pressure triode method
低压三极管离子溅射方法
7.
The results show that the sputtering power significantly affects the compactness of the A1 film.
初步探讨了溅射功率、气压和时间等不同溅射参数对铝层结构和铝层在氟塑料表面附着情况的影响。
8.
The "OUSLAN" spurting film productive technology is in progress in a very big vacuum chamber , very low ina ctive gas of pressure in the environment and under electric energy effect.
溅射膜生产工艺在一个很大的真空室、压力很低的惰性气体环境中及电能作用下进行。
9.
Effects of N_2 partial pressure on the properties of TaN thin films deposited by DC reactive magnetron sputtering
氮分压对磁控溅射制备TaN薄膜性能的影响
10.
Bias Voltages and Growth of Sputtered Al_2O_3 Films on Polythylene Terephthalate Substrates
负偏压对PET上磁控溅射氧化铝薄膜的影响
11.
The application of thin-film sputtering technology in downhole TOR & WOB measurement
溅射薄膜技术在井下扭矩/钻压测量中的应用
12.
Effect of Working Pressure on Ti Thin Film Deposited by Magnetron Sputtering
磁控溅射中工作压强对钛膜沉积的影响
13.
Study on Gas Sensing Properties of SnO_2 Thin Films Deposited by DC Reactive Magnetron Sputtering;
直流磁控溅射法制备SnO_2薄膜及其气敏特性研究
14.
Study on Preparation and Gas-sensing Propertiy of Zn Ti and Zn Sn Co-sputtering Thin Films
Zn、Ti和Zn、Sn共溅射膜的制备及气敏性研究
15.
Effect of Ratio of gas Flowrate on Al_2O_3 Thin Films Prepared by Reactive Magnetron Sputtering
气体流量控制对磁控溅射Al_2O_3薄膜的影响
16.
Study on NO_2 gas sensing characteristics of In-doped ZnO thin films prepared by RF magnetron sputtering
磁控溅射制备In掺杂ZnO薄膜及NO_2气敏特性分析
17.
The Effect of RF Power and Working Gases on the Dielectric Properties of Sialon Thin Films
溅射功率和气氛对Sialon薄膜介电性能的影响
18.
KEYWORDS: GIMS, ion source, anode layer, sputtering, TiN, ion plating， medium frequency, pulsed DC.
中文关键词：气离溅射、子源、极层流、射、化钛、子镀膜、频、冲直流。