1) arc-glow plasma depositing
弧辉等离子沉积
1.
TiN film has been deposited on AZ91D magnesium alloy by arc-glow plasma depositing in order to improve its antiwear performance.
采用弧辉等离子沉积工艺在镁合金AZ91表面涂覆了TiN薄膜。
2.
In this study, a 2 μm thick coating with 12 sub-layers of CrN and TiN is deposited alternately on the surface of magnesium alloy AZ91 by a novel method of arc-glow plasma depositing to improve its wear resistance.
为改进其耐磨性,采用弧辉等离子沉积的新工艺在镁合金 AZ91 表面涂覆 TiN/CrN 多层薄膜。
2) multi arc ion deposition
多弧离子沉积
1.
Ti,Al)N coatings has been deposited on the W18Cr4V HSS by multi arc ion deposition.
利用多弧离子沉积技术在 W18Cr4V高速钢表面沉积 (Ti,Al) N薄膜 ,实验结果表明 (Ti,Al) N薄膜的硬度和抗氧化性能明显优于 Ti N薄膜 ,(Ti,Al) N膜层刀具的寿命大大高于 Ti N膜层刀
3) DC arc plasma jet CVD
直流电弧等离子喷射化学气相沉积
4) DC-arc plasma jet CVD
直流电弧等离子体喷射化学气相沉积
1.
In order to synthesize high quality surface acoustic wave devices and explore the deposition process of diamond films,large-area high-quality diamond films were deposited on silicon substrate by DC-arc plasma jet CVD.
为制备高质量的声表面波器件,探索金刚石薄膜的沉积工艺,采用直流电弧等离子体喷射化学气相沉积技术和特殊的复合衬底技术,在单晶硅衬底上制备了大面积、高质量的金刚石薄膜,成功解决了单晶硅衬底在沉积金刚石薄膜过程中产生的变形问题。
5) RFGDPECVD
射频辉光放电等离子体辅助化学气相沉积
1.
Preparation technique and performances characterization of diamond-like carbon films by RFGDPECVD method
射频辉光放电等离子体辅助化学气相沉积法制备类金刚石碳膜工艺与性能表征
6) plama electrolysis deposition
等离子体电沉积
补充资料：被褐藏辉
1.犹言被褐怀玉。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条