3) Ion beam deposition
离子束沉积
1.
Sn and In soft metal films, Al2O3 ceramic film and In/Al2O3 dual film were prepared with ion beam deposition technique.
采用离子束沉积方法在Ta12W合金表面制备了Sn,In软金属薄膜,Al2O3陶瓷薄膜和In/Al2O3复合薄膜。
2.
The (111) textured cubic silicon carbide (3C-SiC) thin films are deposited on (111) Si substrates using the mass-selected ion beam deposition technique at various substrate temperatures.
在硅衬底上利用具有质量选择功能的低能离子束沉积技术沉积碳离子制备出除碳、硅之外无其他杂质元素的纯净的立方SiC薄膜。
4) iron ion sedimentation
铁离子沉积
5) ion beam assisted deposition(IBAD)
离子束辅助沉积
1.
The microstructure and morphology of the lead telluride optical thin films prepared by ion beam assisted deposition(IBAD) were observed by atomic force microscopy(AFM).
利用原子力显微镜(AFM)研究了离子束辅助沉积碲化铅(PbTe)薄膜的微观结构和表面形貌。
2.
Hf films were synthesized by ion beam assisted deposition(IBAD).
采用离子束辅助沉积方法 (IBAD)在Si(111)衬底上沉积了铪薄膜。
6) ion beam enhanced deposition
离子束增强沉积
1.
Friction properties of nanometer metal coatings prepared by ion beam enhanced deposition;
离子束增强沉积纳米金属薄膜的摩擦特性
2.
Phase transition simulation of the VO_2 film prepared by ion beam enhanced deposition method;
离子束增强沉积VO_2多晶薄膜的相变模拟
3.
Temperature coefficient of resistance of VO_2 polycrystalline film formed by ion beam enhanced deposition;
离子束增强沉积VO_2多晶薄膜的温度系数
补充资料：等离子化学气相沉积
分子式：
CAS号：
性质：PCVD 化学气相沉积(CVD)法是制备无机材料，尤其是无机薄膜和涂层的一种重要手段。用等离子辅助CVD，可在较低的温度下沉积，涂层均匀不剥落。
CAS号：
性质：PCVD 化学气相沉积(CVD)法是制备无机材料，尤其是无机薄膜和涂层的一种重要手段。用等离子辅助CVD，可在较低的温度下沉积，涂层均匀不剥落。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条