1.
Analysis of Residual Stress Distribution in DC Arc Plasma Jet CVD High Quality Diamond Films by Raman Spectroscopy
直流电弧等离子体喷射化学气相沉积高质量金刚石膜残余应力分布的拉曼谱分析(英文)
2.
The Preparation of Diamond Films by DC Arc Plasma Jet CVD
直流等离子喷射化学气相沉积法制备金刚石薄膜
3.
plasma activated chemical vapour deposition
等离子体化学气相沉积
4.
arc plasma jet spraying coating
电弧等离子体射流喷涂涂层
5.
Study on the Residual Stresses and Cracking of Diamond Film Produced by DC Arc Plasma Jet
直流电弧等离子体喷射金刚石膜残余应力及开裂破坏研究
6.
Atmospheric-pressure Plasma Chemical Vapor Deposition for Polycrystalline Silicon Preparation from SiCl_4 and OES Diagnosis
由SiCl_4制备多晶硅的大气压等离子体化学气相沉积及发射光谱诊断
7.
The Study of the Deposition of SiO_2 Films with RF Cold Plasma at Atmospheric-pressure;
常压射频低温等离子体增强化学气相沉积二氧化硅薄膜的研究
8.
TEM Study on Diamond Films Deposited by MPCVD;
微波等离子体化学气相沉积金刚石薄膜的电子显微学分析
9.
Preparation technique and performances characterization of diamond-like carbon films by RFGDPECVD method
射频辉光放电等离子体辅助化学气相沉积法制备类金刚石碳膜工艺与性能表征
10.
Diamond thin films grown up by microwave plasma CVD
微波等离子体化学气相沉积金刚石簿膜
11.
WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP
微波等离子体化学气相沉积装置的工作原理
12.
Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;
磁激活等离子体增强化学气相沉积设备的研制
13.
The Study on DLC Films Deposited by PECVD;
等离子体增强化学气相沉积DLC膜的研究
14.
Study on device of magneto-active PECVD;
磁激活增强等离子体化学气相沉积设备的研制
15.
Research on Dark Features in Diamond Films Produced by DC Arc Plasma Jet Method
高功率直流电弧等离子体喷射法制备的金刚石厚膜中黑色缺陷的研究
16.
Study on Characteristic of Si_3N_4 Nanopowder Prepared by ICPECVD;
ICP等离子体增强化学气相沉积制备纳米粉体氮化硅特性研究
17.
Preparation of Nano-structure Oxide Powder by DC Arc Plasma and Sintered by Spark Plasma Sintering Technique;
氧化物纳米粉末的直流电弧等离子体制备及放电等离子（SPS）烧结
18.
Preparation of bismuth nanoparticles by DC arc plasma method
直流电弧等离子体法制备铋纳米粉体