1) silicon photolithography
硅光刻工艺
1.
Evanescent wave fiber-optic sensors(EWFS)with acicular encapsulation were fabricated using silicon photolithography technology and silica wet-etching technology.
用硅光刻工艺和二氧化硅湿法腐蚀工艺制作了针状封装结构的光纤消逝场传感器。
2) photoetching technology
光刻工艺
1.
In this passage,the steady photoetching technology of BP-212 positive photoresist is researched.
本文分别以玻璃片和AAO模板为基底,使用BP-212型紫外正性光刻胶,进行光刻工艺条件的研究,找到了在本实验条件下的稳定光刻工艺。
3) Lithographic process
光刻工艺
1.
A method of simulating and optimizing lithographic process parameters is proposed based on the concept of effective time difference.
通过引入有效时差的概念 ,提出了一种可模拟光刻工艺参数间的相互关系及优化光刻参数的方法。
4) photolithography
[英][,fəutəli'θɔgrəfi] [美][,fotolɪ'θɑgrəfɪ]
光刻工艺
1.
In the process of image transfer printing in photolithography technology, It is key link to determine the location of the image plane.
在光刻工艺的图形转印过程中,像平面位置的确定是重要的环节。
5) dry photoetching technology
光刻干工艺
6) silicon deep etching process
硅深刻蚀工艺
1.
Making method of high deep-width rate, batch production of planar windings with LIGA process and silicon deep etching process is researched .
较深入地研究了以LIGA工艺、硅深刻蚀工艺为主的平面绕阻的高深宽比、批量化制作方法。
补充资料：采气工艺(见天然气开采工艺)
采气工艺(见天然气开采工艺)
gas production technology
，一‘J\匕乙吕天然气开采工艺pro以uetionteehnology)见
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条