1) Arc Discharge Ion Plating
电弧放电离子镀
2) arc discharge ion-plating
弧光放电离子镀
1.
Super hard refractory intermetallic WC-Co (Co= 0, 4,15 wt-%) films were prepared by arc discharge ion-plating technique.
利用弧光放电离子镀法获得了难熔超硬ＷＣ－Ｃｏ膜（其中含Ｃｏ为０，４，１５ｗｔ－％）。
3) arc ion plating
电弧离子镀
1.
Properties of TiAlCrN coating prepared by arc ion plating;
电弧离子镀TiAlCrN多元涂层的性能研究
2.
Effect of Ce on microstructure and properties of Ti-coatings deposited by arc ion plating;
电弧离子镀(Ti,Ce)N涂层组织与性能研究
3.
Microstructure and oxidation resistance of NiCrAlY coating deposited on Co-based high-temperature alloy by arc ion plating technology;
钴基合金电弧离子镀NiCrAlY涂层的组织结构和抗氧化性能
4) Cathode arc
电弧离子镀
1.
The single-layer and multi-layer CrN coating have been deposited by cathode arc technigue in this paper.
电弧离子镀是一种优良的薄膜沉积技术，有着其它镀膜形式不可比拟的优点：如高的离化率，高的沉积速率和良好的膜基结合强度等，利用这种技术制备的氮化物薄膜，如TiN、CrN等，已经在工业生产中得到了广泛应用。
2.
The hard film Cr+Ti+TiNC/TiNC+C/DLC has been prepared by combining unbalanced magnetron sputtering with cathode arc and Hall ion source.
将中频孪生靶非平衡磁控溅射、电弧离子镀和霍尔离子源辅助沉积三种工艺结合起来制备了Cr+Ti+TiNC／TiNC+C／DLC硬质膜。
3.
The hard black films has been prepared by combining unbalanced magnetron sputtering with middle frequency twin targets magnetron sputtering, cathode arc and Hall ion source.
将中频孪生靶磁控溅射、非平衡磁控溅射、电弧离子镀和霍尔离子源辅助沉积四种技术结合起来开发了复合镀膜工艺,制备了黑色硬质膜。
5) arc ion plating (AIP)
电弧离子镀
1.
Al-O-N and Cr-O-N thin films were deposited on superalloy DSM11 by arc ion plating (AIP).
采用电弧离子镀方法在高温合金DSMll基材上沉积Al-O-N和Cr-O-N薄膜,研究了不同O_2,N_2流量对薄膜相结构的影响以及高温下DSMll/NiCoCrAlY,DSMll/Al-O-N/NiCoCrAlY和DSMll/Cr-O-N/NiCoCrAlY体系的元素互扩散行为。
2.
Ni-Co-Cr-Al-Y-Si-B coatings were deposited on Ni base superalloys DZ125 and DSM11 by arc ion plating (AIP).
采用电弧离子镀技术在DZ125和DSM11两种镍基高温合金基材上沉积Ni-Co-Cr-Al-Y-Si-B涂层,研究了高温合金基材及其Ni-Co-Cr-Al-Y-Si-B涂层在900℃的75％Na2SO4+25％K2SO4熔盐中的热腐蚀行为。
3.
Cr-O-N films with different chemical composition were deposited using arc ion plating (AIP) between NiCoCrAlY coatings and the DSM11 substrate as diffusion barriers.
采用电弧离子镀技术在NiCoCrAlY涂层与高温合金基材DSMll间沉积不同成分的Cr-O-N薄膜作为扩散阻挡 层,研究了900℃下氧化1400 h后DSMll／Cr-O-N／NiCoCrAlY体系中Cr-O-N层阻挡合金元素互扩散的行为以及阻 挡层对涂层氧化动力学曲线的影响。
6) ion plating
放电离子镀
1.
TiN coating deposited by hollow cathode discharge ion plating;
空心阴极放电离子镀法沉积氮化钛涂层
补充资料：电弧
正负两电极接近到一定距离时所产生的持续的火花放电。电弧能产生高温、强光和某些射线，用于照明、焊接、炼钢等。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条