1.
Study on Microstructure and Properties of QTi2.5/Cu Films Prepared by Arc Ion Plating
电弧离子镀QTi2.5/Cu镀层组织与性能分析
2.
Microstructures of NiCoCrAlY Coating Deposited by Arc Ion Plating-a Transmission Electron Microscopy Study
电弧离子镀NiCoCrAlY涂层的透射电镜研究
3.
The principle and construction of the AC arc.
介绍了交流电弧离子镀的原理和结构。
4.
Study of CrSiN Film Deposited by Arc Ion Plating;
电弧离子镀CrSiN薄膜基本性能的研究
5.
Study of CrAlN Film Deposited by Pulsed Bias Arc Ion Plating;
脉冲偏压电弧离子镀CrAlN薄膜性能研究
6.
A Study on Preparation and Oxidation Resistance Property of CrAlTiN Film Deposited by Arc Ion Plating;
电弧离子镀CrAlTiN膜的制备与性能研究
7.
Fundamentals of Pulsed Bias Arc Ion Plating;
脉冲偏压电弧离子镀的工艺基础研究
8.
Study on Arc Ion Plating with Magnetron of Same Basic Component for Both Deposited Layer and the Substrate (QTi2.5／Cu)
QTi2.5/Cu同基合金磁控电弧离子镀研究
9.
Process and Property of the ZrN Coating Made by Vacuum Arc Ion Plating
真空电弧离子镀ZrN涂层的工艺与性能
10.
Preparation and properties of CrN coating by arc ion deposition
电弧离子镀CrN涂层的制备及性能研究
11.
Preparation of Transparent (002) Preferential Orientation AlN Thin Film by Arc Ion Plating
电弧离子镀制备透明(002)AlN薄膜
12.
Effect of N~+ Ion Beam Bombardment on the Properties of Arc-Ion-Plated TIN Films
氮离子束轰击对电弧离子镀TiN膜层的作用
13.
The Study on the Metallic Bipolar Plates of Fuel Cell Modified by Films Deposited by AIP;
燃料电池金属双极板电弧离子镀薄膜改性研究
14.
Dielectric Films of TiO_2 and AlN by Pulsed Bias Arc Ion Plating;
脉冲偏压电弧离子镀沉积TiO_2与AlN介电薄膜
15.
Deposition of chromium nitride coatings by arc ion plating (AIP)
电弧离子镀氮化铬涂层的沉积工艺研究
16.
Superhard Multilayer Films Prepared by Pulsed Bias Arc Ion Plating;
脉冲偏压电弧离子镀沉积超硬多层薄膜
17.
Study on Arc Ion Plating with Magnetron of Same Basic Component for Both Deposited Layer and the Substrate (H62/Cu和QAl9-4/Cu);
H62/Cu和QAl9-4/Cu同基合金磁控电弧离子镀研究
18.
The Nitride Coatings on Aluminium Alloy Substrate by Arc Ion Plating;
铝合金衬底电弧离子镀氮化物膜层的研究