1) zinc nitride films
氮化锌薄膜
2) N-doped ZnO thin films
氮掺杂的氧化锌薄膜
1.
6eV) were very evident in the N-doped ZnO thin films.
目的比较氮掺杂的氧化锌薄膜与纯氧化锌薄膜的发光特性。
4) ZnO thin films
氧化锌薄膜
1.
In this paper, photoluminescence of ZnO thin films, which were deposited by reactive r.
利用直流射频磁控溅射制备了氧化锌薄膜 ,测量了不同温度下的氧化锌薄膜的光致发光 。
2.
The ZnO thin films are fabricated by electrodeposition on n-type InP wafers at constant potential.
采用电化学沉积方法在n型InP(100)(1016)衬底上制备了氧化锌薄膜。
3.
The vacuum evaporation was used for the deposition of Zinc precursor layers,and ZnO thin films were prepared by oxidizing the precursor in the air in the post treatment of annealing processing at different temperatures.
采用真空蒸发镀膜的方法分别在玻璃和硅片衬底上沉积金属锌前驱体,再在空气中通过不同温度的退火氧化处理制得氧化锌薄膜,主要研究了不同退火温度对氧化锌薄膜光电特性的影响。
5) ZnO film
氧化锌薄膜
1.
Preparation and mechanism of p-type ZnO films formed by modified ion beam enhanced deposition method;
离子束增强沉积制备p型氧化锌薄膜及其机理研究
2.
So it could be used as substrate materials of ZnO films.
ZnWO4单晶的a晶面与氧化锌c晶面晶格匹配很好,是制备氧化锌薄膜的优良衬底。
3.
ZnO films were prepared by pulsed laser deposition on crystal silicon substrate.
在单晶硅衬底上用激光脉冲沉积方法制备了氧化锌薄膜,研究了衬底温度对薄膜结构、形貌和发光性能的影响。
6) ZnO thin film
氧化锌薄膜
1.
Al-doped ZnO thin films were fabricated on glass substrates by solgel method.
采用溶胶-凝胶工艺在普通玻璃片上制备了掺铝氧化锌薄膜。
2.
N-doped ZnO thin films are grown by plasma-assisted molecular beam epitaxy (P-MBE) on c-plane sapphire (α-Al_2O_3) using NO as oxygen source and nitrogen dopant.
用等离子辅助分子束外延 (P MBE)的方法 ,在蓝宝石c 平面上外延生长了p型氧化锌薄膜。
3.
ZnO thin film was deposited on nucleation side of freestanding diamond film by RF reactive magnetron sputtering.
采用热丝化学气相沉积(CVD)法制备了自支撑金刚石膜,再通过射频磁控溅射法沉积氧化锌薄膜在自支撑金刚石膜上。
补充资料：氮化锌
分子式： Zn3N2
CAS号：
性质：灰色晶体。相对密度6.22(25℃)。溶于盐酸。在冷水中迅速分解为氢氧化锌和氨。由锌粉在氨气流中于500～600℃反应制得或由氨基锌加热分解而得。
CAS号：
性质：灰色晶体。相对密度6.22(25℃)。溶于盐酸。在冷水中迅速分解为氢氧化锌和氨。由锌粉在氨气流中于500～600℃反应制得或由氨基锌加热分解而得。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条