1) β C 3N 4 film
碳化氮薄膜
2) carbon nitride film
氮化碳薄膜
1.
With a view to the excellent mechanical and tribological properties of carbon nitride(CNx) film and it promising application as wear resistant material and solid lubricant,carbon nitride film was prepared on high-speed steel substrate using magnetron sputtering technique.
采用磁控溅射法在高速钢(HSS)基片上制备了氮化碳薄膜,并以划痕法对其附着力进行了研究。
3) carbon nitride thin film
氮化碳薄膜
1.
Optical properties of carbon nitride thin films prepared by radio frequency sputtering;
氮化碳薄膜的电子结构和光学性质
2.
We present the X-ray diffraction(XRD) spectrum of carbon nitride thin filmsdeposited on Si and alloy steel substrates.
研究了生长在硅片、合金钢片上的氮化碳薄膜的X射线衍射谱(XPD)。
4) carbon nitride films
碳氮薄膜
1.
Carbon nitride films and Ni doped carbon nitride films were fabricated by a DCfacing-target magnetron sputtering system at room temperature and were subsequentlyannealed at different temperatures.
本论文采用对向靶直流磁控溅射法制备了系列碳氮薄膜和掺Ni碳氮薄膜,并对它们进行了退火处理。
2.
Amorphous carbon nitride films have attracted the attentions of various investigators due to their great physic properties and wide range of promising applications such as protecting coatings, electronic devices and biomedicine devices.
非晶碳氮薄膜由于具有良好的物理性质而备受关注,在防护涂层、电子学器件以及生物医学等领域有着广阔的应用前景。
5) BCN thin films
硼碳氮薄膜
1.
Deposited BCN thin films were characterized by Fourier transform infrared spectroscopy(FTIR),Raman spectroscopy(RS).
56 MHz)磁控溅射法沉积硼碳氮薄膜,得到的硼碳氮薄膜可用红外,拉曼表征。
2.
The BCN thin films have been mainly synthesized by chemical vapor deposition (CVD).
近几年来，硼碳氮薄膜的制备和性能研究已逐步成为国际上薄膜研究的热点。
6) carbon thin films doped with nitrogen
掺氮碳薄膜
补充资料：碳化硅晶须补强碳化硅陶瓷基复合材料
分子式：
CAS号：
性质：以碳化硅陶瓷为基和以碳化硅晶须为增强剂的新型陶瓷材料。通过晶须的载荷转移、拔出及裂纹偏转作用，获得比普通碳化硅更高的强度和韧性。使用温度达1400℃。是一种重要的高温结构陶瓷。用于燃气轮机叶片等高温部件和耐磨件制造。采用原位生长工艺和烧结工艺制取。
CAS号：
性质：以碳化硅陶瓷为基和以碳化硅晶须为增强剂的新型陶瓷材料。通过晶须的载荷转移、拔出及裂纹偏转作用，获得比普通碳化硅更高的强度和韧性。使用温度达1400℃。是一种重要的高温结构陶瓷。用于燃气轮机叶片等高温部件和耐磨件制造。采用原位生长工艺和烧结工艺制取。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条