1) vacuum magnetron sputtering
真空磁控溅射
1.
With vacuum magnetron sputtering method, SnO2 film with thickness of 50~70nm was deposited on the polished quartz Pyrex substrate firstly.
在现有的粉末烧结型SnO2基气敏传感器基础上研制了薄膜型SnO2基气体传感器,以抛光的耐热石英玻璃为基片,真空磁控溅射50~70nm厚度的SnO2薄膜,在SnO2薄膜上分别溅射不连续的ZnO、Al2O3、CeO2、InO2等薄膜,传感器背面溅射30μm的Ni80Cr20电阻合金作为传感器加热电阻,用薄膜热电偶测量传感器工作温度。
2.
The infrared absorptance,reflectance and transmittance of the A1/Pb multilayer films made by vacuum magnetron sputtering were investigated using ultraviolet-visible-near infrared spectrophotometer and Fourier transform infrared spectrophotometer.
利用紫外-可见-近红外分光光度计和傅立叶红外光谱仪分析了用真空磁控溅射技术制备的Al/Pb金属多层膜的对红外光的吸收、反射和透射。
2) SCS
太阳能真空集热管磁控溅射镀膜机
1.
Design of SCS Control System Based on FPGA;
基于FPGA的太阳能真空集热管磁控溅射镀膜机控制系统的设计
3) Vacuum sputtering
真空溅射
1.
The Cr-Cu/ Al 2O 3/ZnS /Ag films grown on glass substrate by the way of vacuum sputtering, the fabrication technology on electron emission properties are studied, and the optimum technical parameter is obtained.
介绍了一种用于场致发射显示的平面多层膜电子发射结构的制作过程 ,采用真空溅射的方法镀制玻璃衬底 Cr-Cu Al2 O3 ZnS Ag结构的平面电子源 ,对其发射性能进行了论述 ,并取得优化发射性能的工艺参
4) vacuum sputter
真空溅射
1.
In this paper, with the technology of vacuum sputter, pure aluminum corrosion sensitive film was directly deposited on the core of optical fiber with its clad removed.
用清水反复清洗浸蚀后的光纤,晾干后进行真空溅射镀膜。
2.
The technics of fabricating pure Al corrosion sensing film with vacuum sputter were groped.
探索了利用真空溅射技术在光纤纤芯上沉积纯铝腐蚀敏感膜的工艺。
5) magnetron sputtering
磁控溅射
1.
Preparation and characterization of anti-bacterial nonwovens by magnetron sputtering rare-earth activated TiO_2 onto PET fabric;
磁控溅射制备稀土激活TiO_2复合抗菌非织造布
2.
Effect of depositing process on microstructure chromium nitride coatings deposited by reactive magnetron sputtering;
反应磁控溅射沉积工艺对Cr-N涂层微观结构的影响
3.
Characterization study of Al magnetron sputtering coating on AZ31 magnesium alloy;
AZ31镁合金磁控溅射镀铝膜的性能研究
6) RF magnetron sputtering
磁控溅射
1.
Investigation on organic light-emitting diodes with TiO_2 ultra-thin films as hole buffer layer by RF magnetron sputtering;
磁控溅射法制备TiO_2空穴缓冲层的有机发光器件
2.
ZrN films were synthesized by inductively coupled plasma(ICP)-assisted RF magnetron sputtering.
利用电感耦合等离子体(ICP)辅助射频磁控溅射技术,在Si(111)片表面制备了ZrN薄膜。
3.
The ZnO films were grown on quartz substrates by rf magnetron sputtering.
本工作利用磁控溅射技术在石英衬底上生长出沿c轴择优取向的未掺杂ZnO薄膜,利用X射线衍射,光致发光,X射线光电子谱和Hall效应测量技术,研究了退火温度对结构、电学和光学性质的影响。
补充资料:磁控溅射
分子式:
CAS号:
性质:用一个环形永久磁体在乎板形靶上产生环形磁场,在磁场作用下,电子被约束在一个环状空间内,形成高密度的等离子环。在等离子环内,电子不断地使Ar原子变成Ar离子,Ar离子被加速后打向靶表面,把靶内的原子溅射出来,沉积在基片上形成薄膜。若靶材为导体,溅射电源可用直流或射频电源,如靶材是绝缘体,则必须用射频电源。用多源共溅射加后处理法可制备双面薄膜。将基片放置在靶中心线上,称为正轴溅射,基片放在靶轴线外;称为偏轴溅射。磁控溅射是广泛采用的制膜方法。
CAS号:
性质:用一个环形永久磁体在乎板形靶上产生环形磁场,在磁场作用下,电子被约束在一个环状空间内,形成高密度的等离子环。在等离子环内,电子不断地使Ar原子变成Ar离子,Ar离子被加速后打向靶表面,把靶内的原子溅射出来,沉积在基片上形成薄膜。若靶材为导体,溅射电源可用直流或射频电源,如靶材是绝缘体,则必须用射频电源。用多源共溅射加后处理法可制备双面薄膜。将基片放置在靶中心线上,称为正轴溅射,基片放在靶轴线外;称为偏轴溅射。磁控溅射是广泛采用的制膜方法。
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
参考词条