1.
Electrochemical Performance Research on Sn and Sn/C Intercalation Lithium Film Materials Prepared by Vacuum Sputtering;
锡和锡碳嵌锂薄膜材料的真空溅射制备及电化学性能研究
2.
Vacuum sputter deposition techniques were developed to achieve high Hc , with high Ms materials epitaxially grown on Cr underlayers.
使用真空溅射方法在Cr底层上沉积高矫顽力、高饱和磁化强度的磁记录介质。
3.
Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering
离子束溅射沉积Ir膜真空紫外反射特性研究
4.
Study on Temperature Control System of High Vacuum Magnetron Sputtering Machine;
高真空磁控溅射镀膜机温度控制系统的研究
5.
Preparation of Uranium Film by Ultra High Vacuum Magnetron Sputtering and Its Characterization
超高真空磁控溅射法沉积铀薄膜及其表面状态
6.
Research of the Vacuum Magnetron Sputtering Deposition Equipment and its Prdcess
真空磁控溅射镀膜设备及工艺技术研究
7.
The enterprise deyang sunlight electric co., ltd. has special knowledge within the ranges Roasting, Thyristor and Vacuum coating as well as Sputtering.
公司专业从事晶闸管可控硅整流器、烤架以及真空镀膜和溅射业务。
8.
Design of the Control System of Vacuum Magnetron Sputtering & Coating Equipment Based on Industrial Computer and PLC
基于工控机和PLC的真空磁控溅射镀膜设备控制系统设计
9.
Effect of the background vacuum degree on the properties of the C/Cr coating deposited by non-equilibrium magnetron sputtering
本底真空度对非平衡磁控溅射C/Cr复合镀层性能的影响
10.
Study On Expert PID Temperature Control in High Vacuum Magnetron Sputtering Coating Machine
专家PID温度控制在高真空磁控溅射镀膜机中的应用研究
11.
The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc.
干镀是一种在真空下在聚合物表面沉积金属的方法，包括溅射、气相沉积、真空沉积等。
12.
High-quality flow controller, pressure transducer, pressure gauge ect. for vacuum equipment, coating equipment and semiconductor equipment.
用于真空镀膜、空溅射、导体制造设备的质量流量计、力传感器、力表及相关产品。
13.
Simulation of Proportion Integration Differentiation Neural Network Control of Reactive Sputtering
反应溅射的PID神经网络控制仿真
14.
The "OUSLAN" spurting film productive technology is in progress in a very big vacuum chamber , very low ina ctive gas of pressure in the environment and under electric energy effect.
溅射膜生产工艺在一个很大的真空室、压力很低的惰性气体环境中及电能作用下进行。
15.
Use of Ion Sputter Coating to Prepare the Gold Deposited TiO_2 Nanofiber Photocatalyst and the Photocatalytic Degradation of Acetaldehyde
真空离子溅射法制备TiO_2:Au复合纳米纤维新型光催化剂及其降解乙醛性能研究
16.
Study of Structure and Tribological Properties in Vacuum of MoS_2-Ti Composite Coatings Deposited by Unbalanced Magnetron Sputtering system
非平衡磁控溅射沉积MoS_2-Ti复合薄膜的结构与真空摩擦磨损性能研究
17.
Design of Electrical Control System on a Magnetic Scattering Vacuum Three-target Film Coating Machine;
三靶磁溅式真空镀膜机电气控制系统的研究
18.
sputtered film disk
溅射膜盘 -全称 :溅射薄膜磁盘