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1)  CaN thin film
溅射Ga_2O_3反应自组装
2)  Reactive sputtering
反应溅射
1.
Microstructure and mechanical properties of Ti-Al-Si-N nanocrystalline composite films prepared by the reactive sputtering method;
反应溅射Ti-Al-Si-N纳米晶复合薄膜的微结构与力学性能
2.
Microstructure and mechanical properties of(Al,Ti)(O,N) coatings synthesized by reactive sputtering;
反应溅射(Al,Ti)(O,N)涂层的微结构与力学性能
3.
On-line continuous deposition of SiO_2 by medium frequency reactive sputtering and ITO by direct current sputtering;
中频反应溅射SiO_2膜与直流溅射ITO膜的在线联镀
3)  Reactive magnetron sputtering
反应溅射
4)  Self-assembled Reactions
自组装反应
1.
Study on Self-assembled Reactions of Tri- and Diorganotin Moieties with Mercapto-carboxylate Ligands and Supramolecular Structures of These Derivatives;
二、三烃基氯化锡与巯基羧酸配体的自组装反应及超分子结构研究
5)  RF actively sputtering technique
RF反应溅射
1.
Highly oriented and transparent polycrystalline ZnO films prepared by RF actively sputtering technique;
RF反应溅射法制备高度取向生长的透明多晶ZnO薄膜
6)  reactive co-sputtering
共反应溅射
1.
A new gate dielectric material,HfTiON,is deposited by reactive co-sputtering of Hf and Ti targets in N2/O2 ambient,followed by anneal in N2 at 600 °C and 800 °C respectively for 2 mins.
在N2/O2气氛中,使用Ti、Hf靶共反应溅射在衬底Si上淀积一种新型栅介质材料HfTiON,随后分别在N2气氛中600°C和800°C退火2min。
补充资料:分子自组装
分子式:
CAS号:

性质:在平衡条件下自发组合,以共价键或非共价键连结形成结构确定、分子有序、稳定的分子聚集体。可产生具有热力学极小值的结构,这些结构不仅坚固,而且自身具有对抗外界不纯物质结合的能力。分子自组装在生命系统中普遍存在,是形成各种复杂生物结构的基础。

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