1) Plasma etching technology
等离子体刻蚀技术
2) Ion etching technology
离子刻蚀技术
3) plasma etching
等离子体刻蚀
1.
Effects of plasma etching on Nafion~ membrane performances;
等离子体刻蚀对Nafion~膜性能的影响
2.
Application of Emission Spectrometry in Trace Fluorine Analysis of Flue Gas from Plasma Etching;
发射光谱法在等离子体刻蚀废气微量F元素检测中的应用研究
3.
Study of the ECR plasma etching process of PZT ferroelectric thin film materials;
PZT铁电薄膜材料的ECR等离子体刻蚀研究
4) plasma etch
等离子体刻蚀
1.
Silicon-micro-accelerometer is fabricated by plasma etch technology.
采用等离子体刻蚀技术制作成硅微加速度计。
5) plasma etch
等离子体蚀刻
1.
Improve diffraction efficiency of relief holographic gratings by plasma etch;
用等离子体蚀刻法提高浮雕全息光栅的衍射效率
2.
The plasma etch theory on oxide and polysilicon in microelectronics manufacturing has been investigated.
等离子体蚀刻硅深沟道用作存贮器件的储存电容有非常重要的作用,就等离子体在微电子制造领域中蚀刻二氧化硅,多晶硅的原理和如何控制形状(profile)和深沟道的深度做了研究,解释了HBr,NF3,He_30%O2气体,压力对蚀刻速率,Si/SiO2蚀刻选择比的影响。
6) Plasma Etching
等离子刻蚀
1.
Research on array carbon nanotubes film without substrate by centrifugal infiltration and plasma etching
离心渗透等离子刻蚀法制备无基底阵列式碳纳米管复合膜
2.
The methods for making carbon nanotubes(CNTs)/ polymer composite films by plasma etching are researched.
本文研究了等离子刻蚀碳纳米管(CNTs)聚合物复合膜的工艺,并采用测量接触电阻表征薄膜的刻蚀效果。
补充资料：很刻
1.狠毒忌刻。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条