1) dry plasma etching
等离子干法刻蚀
2) etching,plasma
等离子蚀刻法
3) Plasma Etching
等离子刻蚀
1.
Research on array carbon nanotubes film without substrate by centrifugal infiltration and plasma etching
离心渗透等离子刻蚀法制备无基底阵列式碳纳米管复合膜
2.
The methods for making carbon nanotubes(CNTs)/ polymer composite films by plasma etching are researched.
本文研究了等离子刻蚀碳纳米管(CNTs)聚合物复合膜的工艺,并采用测量接触电阻表征薄膜的刻蚀效果。
4) plasma etching
等离子蚀刻
1.
At the present time,there are processes of punching,numerical control milling,chemical etching and plasma etching to open windows on the PI substrate.
目前采用的在基材上开窗口的方法有机械冲切、数控铣、化学试剂蚀刻法和等离子蚀刻法等。
5) Ar ion beam dry etching
Ar离子束干法刻蚀
6) ion etching
离子蚀刻法
补充资料：刻刻
1.每时每刻。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条