1) etching,plasma
等离子蚀刻法
2) dry plasma etching
等离子干法刻蚀
3) Plasma Etching
等离子刻蚀
1.
Research on array carbon nanotubes film without substrate by centrifugal infiltration and plasma etching
离心渗透等离子刻蚀法制备无基底阵列式碳纳米管复合膜
2.
The methods for making carbon nanotubes(CNTs)/ polymer composite films by plasma etching are researched.
本文研究了等离子刻蚀碳纳米管(CNTs)聚合物复合膜的工艺,并采用测量接触电阻表征薄膜的刻蚀效果。
4) plasma etching
等离子蚀刻
1.
At the present time,there are processes of punching,numerical control milling,chemical etching and plasma etching to open windows on the PI substrate.
目前采用的在基材上开窗口的方法有机械冲切、数控铣、化学试剂蚀刻法和等离子蚀刻法等。
5) ion etching
离子蚀刻法
6) plasma etching
等离子体刻蚀
1.
Effects of plasma etching on Nafion~ membrane performances;
等离子体刻蚀对Nafion~膜性能的影响
2.
Application of Emission Spectrometry in Trace Fluorine Analysis of Flue Gas from Plasma Etching;
发射光谱法在等离子体刻蚀废气微量F元素检测中的应用研究
3.
Study of the ECR plasma etching process of PZT ferroelectric thin film materials;
PZT铁电薄膜材料的ECR等离子体刻蚀研究
补充资料：刻刻
1.每时每刻。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条