1) two step etching method
两步蚀刻法
2) two-step etching
两步刻蚀法
1.
A two-step etching technology is used and the optimized etching parameter is found by experiment to remove etching damage in GaN-LEDs.
通过实验方法找出了去损伤刻蚀的最佳工艺参数,并研究了利用ICP两步刻蚀法去除刻蚀损伤的实验过程及结果。
3) two-step acid etching
两步酸蚀法
4) two step etch
两步腐蚀
5) wet etching
湿法刻蚀
1.
Research on K9 glass wet etching for MOEMS devices;
应用于MOEMS器件的K9玻璃湿法刻蚀工艺的研究
2.
Study on the deep wet etching of the silicon for MEMS;
MEMS中硅的深度湿法刻蚀研究
3.
Influence of wet etching on the morphologies of Si patterned substrates and ZnO epilayers
湿法刻蚀对Si基片孔点阵及ZnO外延薄膜周期形貌的影响
6) dry etching
干法刻蚀
1.
Effect of dry etching on light emission of InAsP/InP SMQWs;
干法刻蚀影响应变量子阱发光的机理研究
2.
Research of dry etching simulator in micromachining;
微加工干法刻蚀工艺模拟工具的研究现状
3.
Research of CCl_2F_2 plasma dry etching InSb-In thin film;
CCl_2F_2等离子体干法刻蚀InSb-In薄膜的研究
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