1) photo etching
光蚀刻法
3) photo-enhanced wet etching
光增强湿法刻蚀
1.
The surface of n-GaN is fabricated by photo-enhanced wet etching with the etchant of 0.
1 MK2S2O8+KOH和氙灯分别作为刻蚀剂和紫外光源,采用光增强湿法刻蚀转移衬底的垂直结构GaN基LED的n型GaN,对N面有电极和没有电极的芯片的n型GaN层进行刻蚀。
4) potoeching
光刻，光蚀
5) laser ablation
激光刻蚀
1.
A Study on PVP and PVK by Surface Enhanced Raman Spectra and the Preparation of Metal Colloids by Laser Ablation;
聚乙烯吡咯烷酮和聚乙烯咔唑的表面增强拉曼光谱研究及激光刻蚀金属胶体的制备
2.
The influences of laser ablation processes on the solubility and the crystallizability of laser evaporated Al2O3-ZrO2 nanopowders were studied by X-ray diffractometer (XRD), X-ray absorption fine structure (XAFS) spectroscope and high resolution electron microscope (HREM).
利用X射线衍射, X射线吸收精细结构谱和高分辨电镜研究了激光刻蚀工艺对 Al2O3-ZrO2固溶度和结晶度的影响。
3.
The micrometer-scaled channels with different width and depth on the Si surface were prepared by pulse laser ablation.
因此,利用激光刻蚀表面方法可以在一定程度上调控固体表面的润湿性能。
6) photochemical etching
光化蚀刻
1.
With the continuousgrowth of electronic technology, photochemical etching tech-nology has expanded into many new application fields and aproduction scale is formed.
介绍了光化蚀刻的由来和传统工艺流程中五种掩膜的制作方法及四种现代的光化蚀刻法流程及其应用范围。
补充资料：光蚀刻
光蚀刻
photoetching
简称光刻。利用照相手段制作抗蚀膜像，用来保护表面，在金属、塑料等上面，借助腐蚀剂进行腐蚀的方法。应用于制作印片或电器的线路板等。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条