1) SiO_2 buffer layer
SiO_2缓冲层
1.
The photoluminescent properties of SiO_2 buffer layer deposited on Si substrate at room temperature was investigated.
研究了在Si衬底上制备的SiO_2缓冲层在室温下的光致发光性能。
2) Buffer layer
缓冲层
1.
Influence of buffer layers on the anisotropic magnetoresistance of NiCo films;
缓冲层对NiCo薄膜各向异性磁致电阻的影响
2.
Sputtering growth of preferential c-axis-oriented aluminum nitride film using homogeneous buffer layer;
利用同质缓冲层溅射生长c轴择优取向氮化铝薄膜
3.
Effects of buffer layer on properties of PMS-PNN-PZT piezoelectric thick film material;
缓冲层对PMS-PNN-PZT压电厚膜材料性能的影响
3) NiFe buffer layer
NiFe缓冲层
1.
NiFe buffer layer thin films with nano-sized crystallites were prepared by electrodeposition on semiconductor Si(111) substrates.
采用电化学沉积法,在半导体硅片上制备了具有纳米晶粒尺寸的NiFe缓冲层薄膜,并确定了获得Ni80Fe20合金的工艺条件。
4) buffer layers
缓冲层
1.
Fabrication of buffer layers and YBaCuO coated conductors by all chemical methods
全化学法制备缓冲层和YBaCuO超导涂层
2.
The yttrium-stabilized zirconia(YSZ)and strontium titanium(STO)film buffer layers were prepared by Sol-gel process on Si substrates.
采用溶胶-凝胶法在硅基板上先分别制备钇稳定氧化锆(YSZ)和钛酸锶(STO)两种薄膜缓冲层。
3.
2MnO_3 (110) film was shown when SrMnO3 (40 nm) buffer layers grown at 500 ℃.
当沉积温度为500℃时,在40nm缓冲层SrMnO3上,La0。
5) buffer
[英]['bʌfə(r)] [美]['bʌfɚ]
缓冲层
1.
Growth of high Pyroelectric Ba_(0.65)Sr_(0.35)TiO_3 Films with Ba_(0.65)Sr_(0.35)RuO_3 Buffer;
利用Ba_(0.65)Sr_(0.35)RuO_3缓冲层制备高热释电系数的Ba_(0.65)Sr_(0.35)TiO_3薄膜
2.
GaN Growth on Si Substrate Using Anodic Alumina as Buffer Layer;
阳极氧化铝作缓冲层的Si基GaN生长
3.
Study on Conversion Characteristics of RSD with Structure of "Thin-base, Buffer and Transparent Anode";
“薄基区—缓冲层—透明阳极”RSD换流特性研究
6) MgO buffer layer
MgO缓冲层
1.
The results show that the preferred orientation of SBN film can be considerably improved by adding the MgO buffer layer.
采用溶胶 -凝胶法在Si(1 0 0 )基片上制备出择优取向的MgO薄膜 ,随后在其上生长出具有择优取向的铌酸锶钡铁电薄膜 实验发现 ,MgO缓冲层的应用可以大大提高SBN薄膜的择优取向性能 同时 ,用五层对称理想波导耦合模理论 ,以SBN为波导层 ,分析了波导损耗与厚度的关系 通过对计算出的理想结果与实际相结合 ,以及对SBN在生长过程工艺与损耗关系的研究 ,制备出高质量、低损耗的SBN薄膜 ,为其在电光波导调制器等微系统中的应用打下良好的基
补充资料：SI
有机硅树脂简称SI，是由三乙氧基硅烷等缩合而成。溶于乙醇、丁醇、醋酸乙酯、丙酮、苯、甲苯、环己酮等。预聚体在低温下能快速固化，固化后的树脂硬度高、耐热、耐磨、耐辐射、耐水、防潮、耐大气老化，低温(-50℃)不脆化。透明度高，可见光透光率90％以上。无毒。
用作酚醛树脂和环氧树脂剂的改性剂，可提高耐热性和耐水性贮存于阴凉、通风、干燥的库房内。
用作酚醛树脂和环氧树脂剂的改性剂，可提高耐热性和耐水性贮存于阴凉、通风、干燥的库房内。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条