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1)  mechanically polished substrate
机械抛光衬底
2)  mechanical polishing
机械抛光
1.
The study on the optimizational technology of the large area free-standing diamond films mechanical polishing;
大面积金刚石自支撑膜机械抛光的优化工艺研究
2.
This paper introduced a precision polishing experiment study on H62(φ80mm)brass with traditional precision mechanical polishing method.
本文采用传统的精密机械抛光方法,对H62黄铜(φ80mm)进行了精密抛光实验研究。
3.
On the basis of briefly reviewing the polishing process techniques of chemically vapor deposited diamond films,an primary investigation on mechanical polishing processes for chemically vapor deposited diamond thick films was carried out using automatic polishing, as well as during polishing process, were observed by means of scanning electron microscope.
在简要综述 CVD金刚石膜光整加工方法的基础上 ,在自动抛磨机上对 CVD金刚石厚膜进行了初步的机械抛光工艺研究 ,借助扫描电子显微镜 (SEM)对抛光前后及抛光过程中 CVD金刚石膜的表面形貌变化进行了观察 ,初步讨论了 CVD金刚石的去除过程。
3)  polisher for butt plate
衬板抛光机
4)  mechanical polisher
机械抛光机
5)  polishing technique of sapphire substrate
蓝宝石衬底抛光
6)  chemically polished substrate
化学抛光衬底
补充资料:抛光剂,抛光混合剂
CAS:68909-13-7
中文名称:焙烧提浓的氟碳铈镧矿;抛光剂,抛光混合剂
英文名称:Bastnaesite, calcined concentrate;Calcined bastnasite;bastnaesite, calcined conc.;polishing compound;Bastnaesite,calcined concentrate
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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