1) photographic mask
照相掩模
2) phase-shifting mask
相移掩模
1.
Phase-shifting mask for 100nm node ArF excimer laser lithography;
用于100nm节点ArF准分子激光光刻的相移掩模技术
2.
Process window improvement is presented due to off-axis illumination(OAI) and phase-shifting mask(PSM) for 193 nm immersion lithography at 65 nm node.
研究了交替型相移掩模及离轴照明对65nm分辨率ArF浸没式光刻的影响。
3) phase mask
相位掩模
1.
Study of diffraction action of phase mask for optical fiber grating fabrication;
制作光纤光栅用相位掩模的衍射行为研究
2.
Fabricating technology of fiber grating with phase masks;
用相位掩模法制作光纤光栅的技术
3.
8% peak reflectivity is fabricated in B/Ge co doped fiber by 248 nm KrF excimer laser irradiated a phase mask.
本文报道了以２４８ｎｍ的ＫｒＦ准分子激光为光源，用相位掩模技术在Ｂ／Ｇｅ双掺光纤上研制出反射率９８。
4) phase shift mask
相移掩模
1.
Therefore, a new approximation model for alternating phase shift mask considering shadowing effects was proposed in this paper, and shadowing ratio was redefined.
因此本文针对交替式相移掩模,提出了一种考虑阴影效应的近似模型。
5) phase-shift mask
移相掩模
6) Phase shifting mask
相移掩模
1.
35 μm contact hole with traditional mask, rim phase shifting mask (PSM), partial rim PSM, attenuating PSM are calculated based on Hopkins model, and the optimum parameters of different PSM are obtained.
35μm方孔的传统透射掩模、边缘相移掩模、部分边缘相移掩模、辅助相移掩模以及衰减相移掩模在硅片表面空间像的光强分布 ,找出了适合于各种相移掩模的最佳参数。
补充资料：照相
照相
摄影的统称。医学诊断上有多种照相，如X线照相、超声波照相、同位素扫描照相等。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条