1.
COMPUTER SIMULATION OF EFFECTS OF PHASE-SHIFT MASK ON AERIAL IMAGE INTENSITY PROFILE OF PHOTOLITHOGRAPHIC PATTERN
相移掩模对曝光图形空间像光强分布影响的计算机模拟
2.
Phase Shift Mask Monitor Scanner Focus;
利用相移光刻掩膜版监测光刻机台焦距
3.
Experimental Research on Photomask Repair System Using Laser Induced Chemical Vapor Deposition(LCVD) Method;
激光化学气相沉积光掩模版修复系统的研究
4.
Model of Assigning Troop of Air Defense Forces Based on Relativity of Target;
基于被掩护目标相关性的防空兵力分配模型
5.
Changing Inscribed Bragg Wavelengths with Biprism in Phase Mask Technique
双棱镜改变写入Bragg波长的相位掩模技术(英文)
6.
Study on a new method for control the profile of chivped phase mask
啁啾光纤光栅相位掩模槽形控制新方法研究
7.
Changing written Bragg wavelengths of fiber gratings via one phase mask and two prisms
利用一块相位掩模和两块棱镜改变光纤光栅的写入Bragg波长(英文)
8.
The pink peaches and green willows set each other off.
桃红柳绿相互掩映。
9.
The Establishment is trying to hide the truth.
当局想要掩盖真相。
10.
Lithography, as used in the manufacture of ICs, is the process of transferring geometic shapes on a mask to the surface of a silicon wafer.
光刻技术应用到集成电路制造中，就是将掩模版的几何图形转移到硅片表面的工艺过程。
11.
mask programmable integration
掩模可编程序集成电路
12.
Hard surface photomask substrates
GB/T15871-1995硬面光掩模基板
13.
electron beam generated mask
电子束技术制造的掩模
14.
hard-surface in-contact mask
表面坚固内接触掩模
15.
electron beam mask generator
电子束掩模图象发生器
16.
mask program read-only memory
掩模程序只读存储器
17.
photoresist mask pattern
光致抗蚀剂掩模图形
18.
electron beam mask system
电子束掩模制造系统