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1)  double glow discharge reactive sputtering technique
双层辉光反应溅射
1.
A preliminary study on the titanium dioxide thin film prepared by double glow discharge reactive sputtering technique was done also.
并对双层辉光反应溅射技术制备TiO_2薄膜的工艺进行了初步研究。
2)  bi targets reactive sputtering
双靶反应溅射
3)  Reactive sputtering
反应溅射
1.
Microstructure and mechanical properties of Ti-Al-Si-N nanocrystalline composite films prepared by the reactive sputtering method;
反应溅射Ti-Al-Si-N纳米晶复合薄膜的微结构与力学性能
2.
Microstructure and mechanical properties of(Al,Ti)(O,N) coatings synthesized by reactive sputtering;
反应溅射(Al,Ti)(O,N)涂层的微结构与力学性能
3.
On-line continuous deposition of SiO_2 by medium frequency reactive sputtering and ITO by direct current sputtering;
中频反应溅射SiO_2膜与直流溅射ITO膜的在线联镀
4)  Reactive magnetron sputtering
反应溅射
5)  glow discharge sputtering
辉光放电溅射
1.
The crystal growth by glow discharge sputterings and ion beam sputterings and thecrystal epitaxy are introduced.
介绍了气相中晶体生长的方法,如辉光放电溅射法和离子束溅射沉积法以及晶体外延生长的方法。
6)  double glow
双层辉光
1.
The preparation processing parameter study of the double glow discharge plasma hydrogen-free carburizing on titanium alloy surface;
钛合金双层辉光放电离子无氢渗碳制备工艺研究
2.
Electrode structure in double glow surface alloying process;
双层辉光离子渗金属电极结构的研究
3.
Absorbing Alloy Element Rate of Surface by Double Glow Plasma Surface Multi-Element Alloying Technique;
双层辉光多元共渗合金元素的吸收率
补充资料:三级反应溅射
分子式:
分子量:
CAS号:

性质:见阴极溅射。

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