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1)  Cr/Gd/Cr films
Cr/Gd/Cr薄膜
1.
The Cr/Gd/Cr films were deposited on glass substrate by DC magnetron sputtering method.
采用直流磁控溅射法在载玻片上制备Cr/Gd/Cr薄膜
2)  SmTbCo/Cr films
SmTbCo/Cr薄膜
1.
SmTbCo/Cr films were prepared by magnetron sputtering.
利用磁控溅射法制备了SmTbCo/Cr薄膜,分析了Sm含量对SmTbCo/Cr薄膜磁光性能的影响。
3)  TbCo/Cr films
TbCo/Cr薄膜
4)  Cr-N film
Cr-N薄膜
1.
Study of the oxidation resistance of Cr-N film;
Cr-N薄膜抗氧化性能的研究
2.
Cr-N films are deposited in this equipment, the influences of deposition parameters on the structure and properties of the films are analyzed, such as the ratio of gas (N2 and Ar),.
分析结果表明,Cr-N薄膜显著提高了基体的显微硬度和耐磨性,Cr-N薄膜硬度是基底硬度的4-8倍。
5)  SmCo/Cr thin film
SmCo/Cr薄膜
1.
SmCo/Cr thin film had prepared by magnetron sputtering more target together.
采用多靶射频磁控共溅射方法制备了SmCo/Cr薄膜,用XRD和VSM测量了各样品的微结构和矫顽力。
6)  Ag/Cr film
Ag/Cr薄膜
补充资料:chromium nitride (cr2n)
CAS:12053-27-9
中文名称:氮化铬
英文名称:chromium nitride (cr2n);chromium nitride
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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