1) Cu(Cr) films
Cu(Cr)薄膜
2) Cr/Gd/Cr films
Cr/Gd/Cr薄膜
1.
The Cr/Gd/Cr films were deposited on glass substrate by DC magnetron sputtering method.
采用直流磁控溅射法在载玻片上制备Cr/Gd/Cr薄膜。
3) Cu-Cr alloy films
Cu-Cr合金膜
1.
Cu-Cr alloy films were deposited on different diffusion barrier layers with ion beam auxiliary co-sputtering that combined magnetron sputtering(MS) and ion beam sputtering(IBS) .
用离子束辅助磁控溅射和离子束溅射共沉积的方法分别在TiN、CrN扩散阻挡层上沉积了Cu-Cr合金膜。
4) SmTbCo/Cr films
SmTbCo/Cr薄膜
1.
SmTbCo/Cr films were prepared by magnetron sputtering.
利用磁控溅射法制备了SmTbCo/Cr薄膜,分析了Sm含量对SmTbCo/Cr薄膜磁光性能的影响。
6) Cr-N film
Cr-N薄膜
1.
Study of the oxidation resistance of Cr-N film;
Cr-N薄膜抗氧化性能的研究
2.
Cr-N films are deposited in this equipment, the influences of deposition parameters on the structure and properties of the films are analyzed, such as the ratio of gas (N2 and Ar),.
分析结果表明,Cr-N薄膜显著提高了基体的显微硬度和耐磨性,Cr-N薄膜硬度是基底硬度的4-8倍。
补充资料：A1-Cu-Co合金中十次对称准晶单晶体及其衍射图
A1-Cu-Co合金中十次对称准晶单晶体及其衍射图
‘ Al Cu—Co合金中十次对称准晶堕晶体e1)及其衍射圈(z) 中国科学盹垒禹研览听供稿
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条