1) atmosphere pressure chemical vapor deposition (APCVD)
常压CVD
2) two-step AP-CVD
两步法常压CVD
3) pressure gradient CVD
压差式CVD
4) low pressure CVD system
低压CVD 系统
5) TEOS─O3atmospheric pressure CVD methodTEOS─O3
大气压CVD法
6) chemical vapor deposition
CVD
1.
The effects of adding fluorine, chlorine, phosphorus and oxygen in C - H systems and the effects of adding oxygen, fluorine in C - S systems on the chemical transport reaction in the production of carbon nanotube (CNT) via chemical vapor deposition(CVD) have been calculated by using software developed by scientists at Russian Academy of Science.
利用俄罗斯科学院研制的软件计算分析了CVD法制备碳纳米管过程中在碳氢体系添加氟、氯、磷、氧等元素及在碳硫体系中加入氧、氟等元素对于化学传递反应的影响,结果表明,这些元素的加入有利于传递反应的进行。
2.
Influences on the percentage of deposited carbon from hydrocarbon via chemical vapor deposition at 700 K to (1 500 K,)101×10~3 Pa and CO via chemical vapor deposition at 700 K to (1 200 K),101×10~3 Pa were calculated by use of the CVD (chemical vapor deposition) software developed by the scientists of Russia Academy of Science.
利用俄罗斯科学院研制的CVD(chemicalvapordeposition)软件计算了在101×103Pa和700K~1500K烃催化热解以及在101×103Pa和700K~1200KCO催化热解影响碳沉积率的因素,并根据碳沉积相边界点的反应物组成绘制了碳沉积边界曲线,预测了碳沉积区,计算结果对多壁碳纳米管的制备提供了有关的信息。
3.
With TiCl4+O2 reaction system, nano-TiO2 powders were prepared by radio frequency plasma chemical vapor deposition (RF-PCVD).
采用高频等离子体化学气相沉积法(RF-PCVD)法,以TiCl4 + O2为反应体系,制备出了纳米级的TiO2粉体。
补充资料:CVD method activated carbon fiber
分子式:
CAS号:
性质:由化学气相沉积法碳纤维而得的纤维。纤维直径0.5~1.0μm,形状长宽比为100~1000,电阻率1.0×10-3Ω·cm,结晶性良,纯度高,微孔径分布范围窄,均一性优良。原料采用乙烯,载体气体为氢气,在氢中的原料浓度为5%(vol),触媒粒子为二茂铁,用10.59μm的CO2激光照射,在常压下的石英反应器中滞留1h,便制得气相法碳纤维,再于1000℃的CO2中活化20min而得产品。用途为各种吸附剂和电子材料。
CAS号:
性质:由化学气相沉积法碳纤维而得的纤维。纤维直径0.5~1.0μm,形状长宽比为100~1000,电阻率1.0×10-3Ω·cm,结晶性良,纯度高,微孔径分布范围窄,均一性优良。原料采用乙烯,载体气体为氢气,在氢中的原料浓度为5%(vol),触媒粒子为二茂铁,用10.59μm的CO2激光照射,在常压下的石英反应器中滞留1h,便制得气相法碳纤维,再于1000℃的CO2中活化20min而得产品。用途为各种吸附剂和电子材料。
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
参考词条