1.
The Preparation of Cubic Boron Nitride Thin Films by ECR CVD System and Study of Their Properties;
ECR CVD制备立方氮化硼薄膜及性能研究
2.
The Fabrication of Continuous High Performance SiC Fiber by Chemical Vapor Deposition;
CVD法制备高性能SiC连续纤维技术
3.
Computer Control System of Producing Carbon Nanotubes with CVD;
CVD法制备纳米碳管的计算机控制系统
4.
The Study of A-Si-H Films Prepared by MWECR CVD;
MWECR CVD制备a-Si:H薄膜光稳定性研究
5.
Simulation of Growth Process of Titania Nanoparticles Synthesized by Flame CVD Process;
火焰CVD法制备TiO_2纳米颗粒的数值模拟
6.
Reserches of Equipment Design and Process Mechanics about CVD(CVI) Silica;
CVD/CVI氧化硅设备研制及工艺机理探索
7.
Oxidation Behaviors and Mechanisms of Boron-Containing CVD SiC Complex Coating;
含硼CVD SiC复合涂层的氧化行为与机理
8.
The Preparation of Device-Quality Hydrogenated Amorphous Silicon Thin Films by Mwecr-Cvd Assisted by Hot-Wire;
热丝辅助MWECR-CVD制备器件级非晶硅薄膜
9.
Deposition Process Study of Device Quality a-Si:H Film by Method of MWECR CVD with High Deposition Rate;
MWECR CVD高速制备a-Si：H薄膜的工艺研究
10.
The Study of the Coating of Silicon Dioxide by CVD Utilizing TEOS-O_3;
CVD法采用TEOS-O_3沉积二氧化硅膜
11.
Synthesis and Characterization of Aligned Carbon Nanotubes Prepared by CVD;
CVD法制备定向纳米碳管及其表征
12.
Study on Growth and Optical Emission of a-SiN_x: H Films Prepared by ECR-CVD;
ECR-CVD制备a-SixN：H薄膜及其发光性能的研究
13.
Control System Development of Vacuum Induction CVI/CVD Processes;
真空感应CVI/CVD过程控制系统开发
14.
Fundamental Study on High-efficiency Polishing for CVD Diamond Thick Film;
CVD金刚石厚膜高效抛光的基础研究
15.
Study of MWECR CVD Deposition Technique for a-Si:H and Properties of a-Si:H;
a-Si:H薄膜的MWECR CVD制备及特性研究
16.
Study on Tribochemical Polishing Technique of CVD Diamond Film;
CVD金刚石膜摩擦化学抛光技术研究
17.
Study on CMP Slurry of CVD Diamond Film;
CVD金刚石膜化学机械抛光液的研制
18.
Technical Study on Deposition of B-C Films by MWECR CVD Method;
MWECR CVD法制备B-C薄膜的工艺研究