1) magnetron sputtering source
磁控溅射源
1.
On the planar rotary magnetron sputtering source;
平面旋转磁控溅射源的研究
2) magnetron sputtering
磁控溅射
1.
Preparation and characterization of anti-bacterial nonwovens by magnetron sputtering rare-earth activated TiO_2 onto PET fabric;
磁控溅射制备稀土激活TiO_2复合抗菌非织造布
2.
Effect of depositing process on microstructure chromium nitride coatings deposited by reactive magnetron sputtering;
反应磁控溅射沉积工艺对Cr-N涂层微观结构的影响
3.
Characterization study of Al magnetron sputtering coating on AZ31 magnesium alloy;
AZ31镁合金磁控溅射镀铝膜的性能研究
3) RF magnetron sputtering
磁控溅射
1.
Investigation on organic light-emitting diodes with TiO_2 ultra-thin films as hole buffer layer by RF magnetron sputtering;
磁控溅射法制备TiO_2空穴缓冲层的有机发光器件
2.
ZrN films were synthesized by inductively coupled plasma(ICP)-assisted RF magnetron sputtering.
利用电感耦合等离子体(ICP)辅助射频磁控溅射技术,在Si(111)片表面制备了ZrN薄膜。
3.
The ZnO films were grown on quartz substrates by rf magnetron sputtering.
本工作利用磁控溅射技术在石英衬底上生长出沿c轴择优取向的未掺杂ZnO薄膜,利用X射线衍射,光致发光,X射线光电子谱和Hall效应测量技术,研究了退火温度对结构、电学和光学性质的影响。
4) magnetic sputtering
磁控溅射
1.
Power supply feedback control of industrial giant target during magnetic sputtering;
工业用巨型磁控溅射靶电源反馈控制的研究
2.
Preparation and analysis of In_2O_3-SnO_2 thin films deposited by magnetic sputtering;
磁控溅射制备In_2O_3-SnO_2薄膜与分析
3.
The fabrication of plane thin-film H_2S gas sensor with magnetic sputtering method;
利用磁控溅射仪制作平面薄膜型H_2S硅微传感器
5) Sputtering
[英]['spʌtə] [美]['spʌtɚ]
磁控溅射
1.
Experiment on Sputtering Metal Thin Film on Wood Surface;
木材磁控溅射镀膜金属试验
2.
Magnetic controlled sputtering were used to produce amorphous SmFe film,and with further annealing,nanocrytalline particles diffused in Cu base are obtained.
本文采用磁控溅射方法得到非晶SmFe薄膜 ,通过时效处理后 ,得到均匀分布在铜基体上的磁性纳米颗粒。
3.
Thin films of TiN were deposited on float glass substrates by DC reactive magnetron sputtering.
用直流反应磁控溅射法在浮法玻璃基片上制备了TiN薄膜。
6) magnetron sputter
磁控溅射
1.
Engineering applications of microarc oxidation and magnetron sputtering;
微弧氧化与磁控溅射的工程应用
2.
Miedema theory was used to design homogeneous mixed alloy ingredient, and magnetron sputtering was used to prepare the alloy.
依据Miedema理论设计合金均值混合成分,采用磁控溅射法制备合金。
3.
09 alloy film was made by magnetron sputter.
l合全膜的制备方法利用430H磁控溅射仪制备合金膜。
补充资料：磁控溅射
分子式：
CAS号：
性质：用一个环形永久磁体在乎板形靶上产生环形磁场，在磁场作用下，电子被约束在一个环状空间内，形成高密度的等离子环。在等离子环内，电子不断地使Ar原子变成Ar离子，Ar离子被加速后打向靶表面，把靶内的原子溅射出来，沉积在基片上形成薄膜。若靶材为导体，溅射电源可用直流或射频电源，如靶材是绝缘体，则必须用射频电源。用多源共溅射加后处理法可制备双面薄膜。将基片放置在靶中心线上，称为正轴溅射，基片放在靶轴线外；称为偏轴溅射。磁控溅射是广泛采用的制膜方法。
CAS号：
性质：用一个环形永久磁体在乎板形靶上产生环形磁场，在磁场作用下，电子被约束在一个环状空间内，形成高密度的等离子环。在等离子环内，电子不断地使Ar原子变成Ar离子，Ar离子被加速后打向靶表面，把靶内的原子溅射出来，沉积在基片上形成薄膜。若靶材为导体，溅射电源可用直流或射频电源，如靶材是绝缘体，则必须用射频电源。用多源共溅射加后处理法可制备双面薄膜。将基片放置在靶中心线上，称为正轴溅射，基片放在靶轴线外；称为偏轴溅射。磁控溅射是广泛采用的制膜方法。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条