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1)  Square-shaped diaphragm
浓硼硅薄膜
2)  boron-doped p+-silicon free-handing diaphragm
浓硼重掺杂硅薄膜
1.
The problem of etching holes was researched during the fabrication of boron-doped p+-silicon free-handing diaphragm using anisotropic wet etching techniques.
研究了自终止腐蚀停法制备浓硼重掺杂硅薄膜的腐蚀孔问题。
3)  born-doped a-Si:H films
掺硼非晶硅薄膜
4)  Na2O-B2O3-SiO2 glass thin film
钠硼硅酸盐玻璃薄膜
1.
Na2O-B2O3-SiO2 glass thin film is suitable for anodic bonding as the intermediate layer.
首先采用射频磁控溅射法在ZrO2陶瓷基体上沉积一层钠硼硅酸盐玻璃,并通过该钠硼硅酸盐玻璃薄膜作为中间层利用阳极键合方法实现了ZrO2陶瓷与单晶硅的间接连接。
5)  Na_2O-B_2O_3-SiO_2 system glass thin film
钠硼硅系玻璃薄膜
6)  boron doped carbon thin film
掺硼碳薄膜
补充资料:二甲基(硅氧烷与聚硅氧烷)和硼酐的聚合物
CAS: 75783-29-8
中文名称: 二甲基(硅氧烷与聚硅氧烷)和硼酐的聚合物

英文名称: Siloxanes and Silicones, di-Me, polymers with boron oxide
siloxanes and silicones, di-me, polymers with boron oxide (b2o3)
siloxanes and silicones, di-me, polymers with boronoxide (b2o3)
Siloxanes and Silicones,di-Me,polymers with boron oxide
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