1) sensitization-chemical etching
敏化蚀刻
2) chemistry etching
化学蚀刻
1.
In this paper, a generated method of 2-D binary phase grating by chemistry etching is presented.
本文介绍用化学蚀刻的方法制作二维二元位相光栅。
3) photochemical etching
光化蚀刻
1.
With the continuousgrowth of electronic technology, photochemical etching tech-nology has expanded into many new application fields and aproduction scale is formed.
介绍了光化蚀刻的由来和传统工艺流程中五种掩膜的制作方法及四种现代的光化蚀刻法流程及其应用范围。
4) chemical etching
化学刻蚀
1.
A simple chemical etching method was developed for fabricating the super-hydrophobic surface on polycrystalline aluminum alloy.
采用简单化学刻蚀的方法制备出多晶铝合金基体上的超疏水表面。
2.
By using effective chemical etching and scavenging system(HNO 3+NaOH) and the optimized experimental parameters, such as the etching time, etching current density, concentration of etchant or scavenger, the etched patterns were obtained, which is close to negative copy of the mold.
运用约束刻蚀剂层技术 (CELT)在金属铜 (Cu)表面实现了三维微图形加工 ,取得成功的关键因素在于寻找到能对Cu进行有效CELT加工的化学刻蚀和捕捉体系。
3.
In this work,the techniques of the electrochemical etching and the chemical etching have been developed for the titanium surface modification.
发展电化学刻蚀和化学刻蚀技术,对钛表面进行处理,并应用扫描电镜、X射线衍射方法对其表面进行表征,探讨电化学刻蚀钛表面形成微观结构的机理。
5) chemical etch
化学蚀刻
1.
An easy-to-perform chemical etch method with a good repeatability was studies based on discussions of color metallography and its developments.
对易获得重现性好的化学蚀刻法进行了探研。
2.
The depth distribution of tritium in stainless steel was measured by chemical etching.
采用化学蚀刻法测定了氚在不锈钢材料中的纵向分布。
6) enhanced etching
强化刻蚀
1.
Influence of hydrogen-enhanced etching on the quality of diamond films and the existing form of sp2 bonding carbon atoms;
氢的强化刻蚀对金刚石薄膜品质的影响与sp~2杂化碳原子的存在形态
补充资料：敏化
分子式：
CAS号：
性质： 不锈钢在450～800℃温度区间停留一段时间或缓慢冷却，从而导致晶界析出以Cr23C6为主的铬的碳化物的过程。敏化使晶界附近区域的铬含量降低，耐蚀性下降，在使用过程中发生晶间腐蚀的敏感性增大。
CAS号：
性质： 不锈钢在450～800℃温度区间停留一段时间或缓慢冷却，从而导致晶界析出以Cr23C6为主的铬的碳化物的过程。敏化使晶界附近区域的铬含量降低，耐蚀性下降，在使用过程中发生晶间腐蚀的敏感性增大。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条