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1)  micro photoluminescence
微区光致发光谱
1.
The characterization of high Al containing AlGaAs oxidized layers and the compressive strain effect of oxide layer on the active region are discussed for the fabrication of visible vertical cavity surface emitting lasers (VCSEL) by wet oxidation and micro photoluminescence spectrum measurement respectively.
针对可见光垂直腔面发射激光器的制备 ,通过湿氮氧化实验和测量微区光致发光谱分别研究了高铝组分Alx Ga1 - x As的氧化特性及氧化产物的收缩应力对有源区的影响 ,结合器件结构设计确定了氧化限制层 Alx Ga1 - x-As的铝组分和最佳位置 ,并制备出了低阈值电流的 Al Ga In P系垂直腔面发射激光
2)  photoluminescence spectra
光致发光谱
1.
Broadband yellow luminescence in the photoluminescence spectra of n-GaN implanted by the different ions;
离子注入n型GaN光致发光谱中宽黄光发射带研究
2.
The influence of MgF_2 doping on the luminescence properties of lead tungstate(PbWO_4,PWO)crystal has been investi- gated by correlated measurements of transmission spectra and photoluminescence spectra and light yield.
通过透射光谱、光致发光谱、光产额的测试,研究了提拉法生长的掺MgF_2的钨酸铅(PbWO_4,PWO)晶体的发光性能。
3.
Photoluminescence spectra peaks as a function.
本文通过Ⅱ-Ⅵ族稀磁半导体超晶格ZnSe/Zn1-xMnxSe的光致发光谱的测量,对其应力效应进行了讨论。
3)  photoluminescence spectrum
光致发光谱
1.
The synthesized powder was characterized by X -ray powder diffraction, high resolution transmission electron microscopy(HRTEM) and photoluminescence spectrum.
测量了合成粉末的X射线衍射谱、光致发光谱和高分辨透射电子显微像 (HRTEM) ,发现合成的粉末是平均粒度为 3 2nm的纤锌矿结构的氮化铝 ,此AlN中存在蓝光发光带 。
4)  photoluminescence [,fəutəu,lju:mi'nesns]
光致发光谱
1.
15) by magnetron sputtering and studied the transmittance and photoluminescence of the samples.
研究光的透过率和光致发光谱(PL谱)。
2.
Compared with the absorbance spectrum, the photoluminescence excited by laser with λ=395nm has Stokes shift.
与薄膜的吸收谱线比较,在375nm飞秒激光激发下测量的量子点的光致发光谱存在Stokes位移。
3.
The structural and optical properties were characterized with X-ray diffraction(XRD)and photoluminescence(PL),respectively.
利用X射线衍射(XRD)和光致发光谱(PL)对薄膜的结构和光学性能进行研究。
5)  PL
光致发光谱
1.
By means of optical absorption,photoluminescence(PL),and ellipsometric spectra,metal organic chemical vapor deposition(MOCVD)grown InN films are investigated.
利用吸收光谱、光致发光谱、喇曼散射光谱和椭圆偏振光谱一系列光学手段,对采用金属有机物气相沉积法(MOCVD)制备的InN薄膜的光学性质进行了系统研究。
2.
The crystallization of the top Si layer in SIMOX,especia ll y the behavior of residual oxygen in the top Si layer,is investigated by means o f PL and SIMS,with the sample of P type(100) Si.
利用光致发光谱 (PL)和二次离子质谱 (SIMS)检测了不同退火条件下处理的 SIMOX材料的顶层硅膜 。
3.
Properties of Al-doped 4H-SiC epitaxial layer,grown by CVD on the 4H-SiC were studied using scanning electron microscope(SEM),X-ray diffraction(XRD)and photoluminescence(PL).
利用扫描电子显微镜(SEM)、X射线双晶衍射谱(XRD)和光致发光谱(PL)对在4H-SiC单晶衬底上采用CVD同质外延的4H-SiC单晶薄膜的特性进行研究,发现外延层有很好的晶格结构和完整性。
6)  PL spectra
光致发光谱
1.
Absorption and PL spectra have been investigated with composition x= 0.
037系列样品,在73K—300K范围内分别在可见和近红外区测量了吸收光谱和光致发光谱。
补充资料:激光微区发射光谱法
分子式:
CAS号:

性质:将高强度的激光束聚焦于试样的微小面积上,在毫秒(ms)级的很短时间内,使试样汽化形成等离子体,辅助石墨电极放电将试样等离子体激发发出光谱,根据所发射的光谱及其强度进行定性和定量分析。该法的优点是试样损伤小,分析速度快,基体效应小。不导电的样品也可直接进行分析。

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