1) SmCo/Cr thin film
SmCo/Cr薄膜
1.
SmCo/Cr thin film had prepared by magnetron sputtering more target together.
采用多靶射频磁控共溅射方法制备了SmCo/Cr薄膜,用XRD和VSM测量了各样品的微结构和矫顽力。
2) SmCo(Al,Si) thin film
SmCo(Al,Si)/Cr薄膜
3) SmCo thin film
SmCo薄膜
1.
Effect of Cu underlayer on magnetic properties of SmCo thin films;
Cu底层对SmCo薄膜磁性能的影响
2.
SmCo thin films were prepared by DC magnetron sputtering and the relations between the technological parameters and its depositing rate were studied.
用直流磁控溅射方法制备了SmCo薄膜,通过正交设计实验考察了工艺因素对薄膜沉积速率的影响规律。
3.
With the results of EDS、XRD、VSM and STM, we can get the following conclusions: (1)The effect of sputtering parameters on magnetic properties of SmCo thin films is obvious.
本文采用磁控溅射方法制备了SmCo系列单层和多层磁性薄膜,并采用X射线能量色散谱仪(EDS)、X射线衍射分析仪(XRD)、振动样品磁强计(VSM)和扫描隧道显微镜(STM)等对薄膜的成分、结构、磁学性能和表面形貌进行了研究,研究发现: (1)溅射工艺参数对SmCo薄膜磁性能的影响明显。
4) SmCo film
SmCo薄膜
1.
Asymmetry crystallization and magnetism of SmCo film;
SmCo薄膜的不均匀晶化及其磁性能
2.
The results shows that after 600 ℃,30min annealing,the coercivity of SmCo films will be increased and the magnetic anisotropy will be changed from in-plane to normal-plane.
结果表明,在600℃下退火30分钟,SmCo薄膜样品的矫顽力升高,并且磁化取向有从面内转向垂直方向的趋势。
5) SmCo granular films
SmCo颗粒薄膜
6) Cr/Gd/Cr films
Cr/Gd/Cr薄膜
1.
The Cr/Gd/Cr films were deposited on glass substrate by DC magnetron sputtering method.
采用直流磁控溅射法在载玻片上制备Cr/Gd/Cr薄膜。
补充资料：(oc-6-11)-chromium carbonyl (cr(co)6
CAS：13007-92-6
分子式：C6CrO6
分子质量：220.06
沸点：220℃
熔点：150-155℃
中文名称：六羰基铬
英文名称：(OC-6-11)-Chromium carbonyl；chromium carbonyl；(oc-6-11)-chromium carbonyl (cr(co)6；chromium carbonyl (oc-6-11)；chromium hexacarbonyl；hexacarbonyl chromium；chromiumcarbonyl；Chromium carbonyl,(OC-6-11)-；Chromium carbonyl；Hexacarbonylchromium
分子式：C6CrO6
分子质量：220.06
沸点：220℃
熔点：150-155℃
中文名称：六羰基铬
英文名称：(OC-6-11)-Chromium carbonyl；chromium carbonyl；(oc-6-11)-chromium carbonyl (cr(co)6；chromium carbonyl (oc-6-11)；chromium hexacarbonyl；hexacarbonyl chromium；chromiumcarbonyl；Chromium carbonyl,(OC-6-11)-；Chromium carbonyl；Hexacarbonylchromium
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条