1) carbon nitride films
碳氮薄膜
1.
Carbon nitride films and Ni doped carbon nitride films were fabricated by a DCfacing-target magnetron sputtering system at room temperature and were subsequentlyannealed at different temperatures.
本论文采用对向靶直流磁控溅射法制备了系列碳氮薄膜和掺Ni碳氮薄膜,并对它们进行了退火处理。
2.
Amorphous carbon nitride films have attracted the attentions of various investigators due to their great physic properties and wide range of promising applications such as protecting coatings, electronic devices and biomedicine devices.
非晶碳氮薄膜由于具有良好的物理性质而备受关注,在防护涂层、电子学器件以及生物医学等领域有着广阔的应用前景。
2) carbon nitride film
氮化碳薄膜
1.
With a view to the excellent mechanical and tribological properties of carbon nitride(CNx) film and it promising application as wear resistant material and solid lubricant,carbon nitride film was prepared on high-speed steel substrate using magnetron sputtering technique.
采用磁控溅射法在高速钢(HSS)基片上制备了氮化碳薄膜,并以划痕法对其附着力进行了研究。
3) β C 3N 4 film
碳化氮薄膜
4) BCN thin films
硼碳氮薄膜
1.
Deposited BCN thin films were characterized by Fourier transform infrared spectroscopy(FTIR),Raman spectroscopy(RS).
56 MHz)磁控溅射法沉积硼碳氮薄膜,得到的硼碳氮薄膜可用红外,拉曼表征。
2.
The BCN thin films have been mainly synthesized by chemical vapor deposition (CVD).
近几年来，硼碳氮薄膜的制备和性能研究已逐步成为国际上薄膜研究的热点。
5) carbon thin films doped with nitrogen
掺氮碳薄膜
6) carbon nitride thin film
氮化碳薄膜
1.
Optical properties of carbon nitride thin films prepared by radio frequency sputtering;
氮化碳薄膜的电子结构和光学性质
2.
We present the X-ray diffraction(XRD) spectrum of carbon nitride thin filmsdeposited on Si and alloy steel substrates.
研究了生长在硅片、合金钢片上的氮化碳薄膜的X射线衍射谱(XPD)。
补充资料：1,8-二氮杂双环[5.4.0]十一碳-7-烯
分子式：C9H16N2
分子量：152.24
CAS号：6674-22-2
性质：密度1.019。熔点-70°C。沸点261°C。折射率1.521-1.523。闪点116°C。WATER SOLUBILITsoluble。
分子量：152.24
CAS号：6674-22-2
性质：密度1.019。熔点-70°C。沸点261°C。折射率1.521-1.523。闪点116°C。WATER SOLUBILITsoluble。
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参考词条