1) B-C-N film
硼碳氮(B-C-N)薄膜
1.
The effects of processing parameters on deposition rate of the B-C-N film were studied using a nano-indenting device.
利用直流磁控溅射技术制备了三元硼碳氮(B-C-N)薄膜,通过改变靶功率、基体偏压、沉积温度和励磁线圈电流,在相同沉积时间内得到不同厚度的薄膜。
2) BCN thin films
硼碳氮薄膜
1.
Deposited BCN thin films were characterized by Fourier transform infrared spectroscopy(FTIR),Raman spectroscopy(RS).
56 MHz)磁控溅射法沉积硼碳氮薄膜,得到的硼碳氮薄膜可用红外,拉曼表征。
2.
The BCN thin films have been mainly synthesized by chemical vapor deposition (CVD).
近几年来，硼碳氮薄膜的制备和性能研究已逐步成为国际上薄膜研究的热点。
3) cubic boron nitride (c-BN) film
立方氮化硼(c-BN)薄膜
4) carbon nitride films
碳氮薄膜
1.
Carbon nitride films and Ni doped carbon nitride films were fabricated by a DCfacing-target magnetron sputtering system at room temperature and were subsequentlyannealed at different temperatures.
本论文采用对向靶直流磁控溅射法制备了系列碳氮薄膜和掺Ni碳氮薄膜,并对它们进行了退火处理。
2.
Amorphous carbon nitride films have attracted the attentions of various investigators due to their great physic properties and wide range of promising applications such as protecting coatings, electronic devices and biomedicine devices.
非晶碳氮薄膜由于具有良好的物理性质而备受关注,在防护涂层、电子学器件以及生物医学等领域有着广阔的应用前景。
5) BN film
氮化硼薄膜
1.
6 while deposited BN films,and the antifriction effect is obvious.
采用射频磁控溅射法在T10碳素工具钢表面制备了氮化硼薄膜;研究了在基材和薄膜之间化学镀N i-P中间层对薄膜结合力的影响;使用摩擦试验机对基材和镀膜后的试样进行了摩擦性能检测;通过划痕试验进行了结合强度试验。
2.
With optical microscope, friction and wear spectrometer and scratch spectrometer, the influence of the parameters of sputtering time, sputtering power and interface layer on the film was studied The results showed that the friction factor of BN film was about half of that of the steel based materials, and the cohesion between film and substrate could obviously be.
采用射频磁控溅射方法在T10钢表面获得了氮化硼薄膜。
3.
BN films, synthesized by ion beam assisted deposition, were analysed by RBS,AES, IR spectra and TEM.
用离子束辅助沉积(IBAD)技术合成氮化硼薄膜,红外吸收谱和透射电镜的观测结果显示,薄膜含有c—BN和h—BN相薄膜Knoop硬度值高达35GPa。
6) boron nitride thin film
氮化硼薄膜
1.
Amorphous boron nitride thin film was prepared on the titanium coated ceramic substrate by pulsed laser deposition technique (PLD).
利用脉冲激光沉积 (PLD)技术在镀钛的陶瓷衬底上制备出了非晶态氮化硼薄膜 ,借助于X射线衍射(XRD)、扫描电子显微镜 (SEM )及Raman光谱分析了该薄膜的结构 ,并研究了薄膜场致电子发射特性 ,阈值电场为4 6V μm ,当电场为 9V μm时 ,电流密度为 5 0 μA cm2 。
补充资料：碳氮硼三元共渗
分子式：
CAS号：
性质：碳氮硼三元共渗是使钢制工件同时渗入碳、氮、硼三种元素的化学热处理工艺。共渗后渗层的硬度较渗硼为低(HV600～1000)。碳氮硼三元共渗如用于石油机械易损零件，能提高使用寿命。碳氮硼三元共渗后空冷即可得到HV750的硬度，对于上述钢材制造的薄小工件，可以省去淬火工序。碳氮硼三元共渗也可以在气体介质中进行，例如用尿素(2500g)、甲醇(8L)、硼酸三甲酯(5L)、丙酮(6L)的混合渗剂滴入840~860℃的井式渗碳炉中，保温3～5h后，在低碳合金渗碳钢上可得到0.4～0.6mm渗层，表面硬度达HRC63～65，甚至更高。
CAS号：
性质：碳氮硼三元共渗是使钢制工件同时渗入碳、氮、硼三种元素的化学热处理工艺。共渗后渗层的硬度较渗硼为低(HV600～1000)。碳氮硼三元共渗如用于石油机械易损零件，能提高使用寿命。碳氮硼三元共渗后空冷即可得到HV750的硬度，对于上述钢材制造的薄小工件，可以省去淬火工序。碳氮硼三元共渗也可以在气体介质中进行，例如用尿素(2500g)、甲醇(8L)、硼酸三甲酯(5L)、丙酮(6L)的混合渗剂滴入840~860℃的井式渗碳炉中，保温3～5h后，在低碳合金渗碳钢上可得到0.4～0.6mm渗层，表面硬度达HRC63～65，甚至更高。
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参考词条