1) plasma type cathodlic are source-magnetron sputtering
等离子体型阴极弧源-磁控溅射镀
2) magnetron sputter ion plating
磁控溅射离子镀
1.
Electrochemical corrosion behaviors of depleted uranium coated with niobium deposited by magnetron sputter ion plating were studied by electrochemical technology, scanning electron microscope (SEM) and X–ray energy dispersive spectroscope (EDS).
利用电化学测试技术、扫描电镜(SEM)及X射线能谱(EDS)对磁控溅射离子镀铌贫铀的电化学腐蚀行为进行了研究。
2.
An experiment of depositing TiN coating on the surface of HSS W18Cr4V by magnetron sputter ion plating (MSIP) method was carried out.
采用磁控溅射离子镀法(MSIP)对高速钢W18Cr4V进行了TiN镀膜试验,对镀膜后试样的各项性能进行了测试分析,并对溅射时间、氮分压、溅射电流等工艺参数对TiN膜层的显微组织、厚度、硬度和耐磨性的影响进行了研究,确定了可获得最佳涂层综合性能的镀膜工艺参数。
3.
By using the physical vapor deposition(PVD) coating technology of closed field unbalance magnetron sputter ion plating(CFUBMSIP),the high-speed steel(HSS) twist drills with graded CrAlTiN coatings are made.
用闭合场非平衡磁控溅射离子镀PVD涂层工艺在高速钢麻花钻上沉积了CrA lTiN梯度涂层。
3) magnetron sputtering ion plating
磁控溅射离子镀
1.
Aluminum coating was prepared by magnetron sputtering ion plating(MSIP) with pulsed bias on depleted uranium surface.
采用脉冲偏压磁控溅射离子镀(MSIP)技术在贫铀表面制备铝镀层,利用电化学测试技术、扫描电镜(SEM)及X射线能谱(EDS)对铝镀层在50μg/g Cl-水溶液中的电化学腐蚀行为进行研究。
4) filtered cathodic arc plasma
磁过滤阴极弧等离子体
1.
Titanium nitride coatings were deposited on unheated stainless steel substrate and stainless steel substrate heated to 400 ℃ by filtered cathodic arc plasma deposition (FCAP) and direct current magnetron sputtering deposition (DCSP), respectively.
分别利用磁过滤阴极弧等离子体沉积装置和直流磁控溅射装置在不锈钢基底上制备了 Ti N涂层 ,采用 X射线光电子能谱仪、X射线衍射仪和扫描电子显微镜对涂层的结构及形貌进行了表征 ;利用纳米压痕仪测定了涂层的硬度 ;在 DF- PM型动摩擦系数精密测定仪上考察了涂层的摩擦学性能 。
2.
This thesis focused on the preparation of amorphous carbon nanotip arrays for excellent field emission cathode material by a unique combination of the anodic aluminum oxide (AAO) template and filtered cathodic arc plasma (FCAP) technology.
本论文以磁过滤阴极弧等离子体技术结合阳极氧化铝模板制备冷阴极场发射材料非晶碳纳米尖点阵列膜为重点,分别对阳极氧化铝模板的制备工艺、模板孔径大小和孔道开口形状的准确控制及其性能进行了研究探讨,对非晶碳纳米尖点阵列的制备技术、性能进行了较为深入详细的分析探讨。
5) magnetron sputtering plasma
等离子体磁控溅射沉积
6) cathodic are metal plasma source
阴极弧金属等离子体源
1.
One main feature of the cathodic are metal plasma source is existing macroparticles which are transported with metal plasma,and the widely application possibility of the cathodic arc metal plasma source is often affected by the serious macroparticles problem.
液滴的存在并伴随着金属等离子体输运是阴极弧金属等离子体源的主要特性之一,液滴问题的严重性常常影响着阴极弧金属等离子体源广泛应用的可能性。
补充资料：阴极溅射室
分子式：
CAS号：
性质：一种测定固体试样的特殊原子化器。将试样车成空心棒状体，作为阴极密封于两端为光窗的金属圆筒中，充入惰性气体。阴、阳极之间加电压600V、电流60mA放电，使试样原子化。其放电原理与空心阴极灯相同。
CAS号：
性质：一种测定固体试样的特殊原子化器。将试样车成空心棒状体，作为阴极密封于两端为光窗的金属圆筒中，充入惰性气体。阴、阳极之间加电压600V、电流60mA放电，使试样原子化。其放电原理与空心阴极灯相同。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条