1) high-energy magnetron sputtering ion plating
高能级磁控溅射离子镀
2) magnetron sputter ion plating
磁控溅射离子镀
1.
Electrochemical corrosion behaviors of depleted uranium coated with niobium deposited by magnetron sputter ion plating were studied by electrochemical technology, scanning electron microscope (SEM) and X–ray energy dispersive spectroscope (EDS).
利用电化学测试技术、扫描电镜(SEM)及X射线能谱(EDS)对磁控溅射离子镀铌贫铀的电化学腐蚀行为进行了研究。
2.
An experiment of depositing TiN coating on the surface of HSS W18Cr4V by magnetron sputter ion plating (MSIP) method was carried out.
采用磁控溅射离子镀法(MSIP)对高速钢W18Cr4V进行了TiN镀膜试验,对镀膜后试样的各项性能进行了测试分析,并对溅射时间、氮分压、溅射电流等工艺参数对TiN膜层的显微组织、厚度、硬度和耐磨性的影响进行了研究,确定了可获得最佳涂层综合性能的镀膜工艺参数。
3.
By using the physical vapor deposition(PVD) coating technology of closed field unbalance magnetron sputter ion plating(CFUBMSIP),the high-speed steel(HSS) twist drills with graded CrAlTiN coatings are made.
用闭合场非平衡磁控溅射离子镀PVD涂层工艺在高速钢麻花钻上沉积了CrA lTiN梯度涂层。
3) magnetron sputtering ion plating
磁控溅射离子镀
1.
Aluminum coating was prepared by magnetron sputtering ion plating(MSIP) with pulsed bias on depleted uranium surface.
采用脉冲偏压磁控溅射离子镀(MSIP)技术在贫铀表面制备铝镀层,利用电化学测试技术、扫描电镜(SEM)及X射线能谱(EDS)对铝镀层在50μg/g Cl-水溶液中的电化学腐蚀行为进行研究。
5) unbalanced magnetron sputter ion plating technique
非平衡磁控溅射离子镀技术
1.
A series of CrTiAlN hard gradient coatings were produced using the closed field unbalanced magnetron sputter ion plating technique on M2 high speed steel and Si substrates with substrate bias voltage changing,and the friction and wear properties were studied.
应用闭合场非平衡磁控溅射离子镀技术在高速钢和单晶硅基体上制备了一组随基体偏压变化的CrTiAlN梯度镀层,并测试了其摩擦学性能。
6) plasma type cathodlic are source-magnetron sputtering
等离子体型阴极弧源-磁控溅射镀
补充资料：多功能磁控溅射镀膜机
多功能磁控溅射镀膜机
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说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条