1) plasma immersion ion implantation and deposition
等离子浸没离子注入和沉积
1.
Diamond-like carbon(DLC) films were fabricated on NiTi alloys using plasma immersion ion implantation and deposition(PIIID).
采用等离子浸没离子注入和沉积(PIIID)法以C2H2为等离子源对NiTi合金进行表面改性。
2.
Diamond-like carbon(DLC) coatings were fabricated by plasma immersion ion implantation and deposition(PIIID) using two different plasma sources such as C_2H_2 and graphite as plasma source to improve the corrosion resistance of the NiTi alloys.
采用等离子浸没离子注入和沉积(PIIID)法分别以C2H2和石墨为等离子源在NiTi合金表面形成DLC涂层来提高该合金的耐腐蚀性。
2) novel plasma immersion ion implantation and deposition
新型等离子浸没离子注入和沉积
1.
Diamond-like carbon (DLC) film was fabricated on NiTi alloys surface adopting novel plasma immersion ion implantation and deposition (PIIID) at room temperature, using C2H2 as plasma source.
采用新型等离子浸没离子注入和沉积(PIIID)法以C2H2为等离子源对NiTi合金进行表面改性。
3) Metal plasma immersion ion implantation and deposition
金属等离子体浸没离子注入与沉积
4) Plasma Immersion Ion Implantation and deposition
等离子体浸没离子注入与沉积
1.
Using plasma immersion ion implantation and deposition (PIIID), Ti/DLC and W/DLC multilayer were synthesized on GCr15 and 2Cr13 steel.
本研究采用等离子体浸没离子注入与沉积(PIIID)技术在GCr15钢和2Cr13钢表面制备了Ti/DLC和W/DLC纳米多层薄膜,DLC、Ti和W层均通过PIIID技术中的阴极弧沉积方法来制备。
5) plasma immersion ion implantation and deposition(PIII&D)
等离子体浸没离子注入与沉积(PIII&D)
6) Plasma immersion ion implantation and deposition (PIII&D)
等离子体浸没离子注入与沉积(PⅢ&D)
补充资料：等离子溶液
分子式：
CAS号：
性质：又称等氢离子溶液，即氢离子浓度同一的溶液。当两种氢离子浓度相等的溶液混合时，各溶质的电离平衡不受影响，离解百分率(即电离度)也不致改变。
CAS号：
性质：又称等氢离子溶液，即氢离子浓度同一的溶液。当两种氢离子浓度相等的溶液混合时，各溶质的电离平衡不受影响，离解百分率(即电离度)也不致改变。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条