1) ZrO2/SiO2 film
ZrO2/SiO2薄膜
2) ZrO 2/SiO 2 multilayers
ZrO2/SiO2多层膜
1.
The effect of period of repeating thickness on the stress is studied in ZrO 2/SiO 2 multilayers deposited by electron beam evaporation on BK7 glass and fused silica substrates, separately.
ZrO2/SiO2多层膜由相同沉积条件下的电子束蒸发方法制备而成,通过改变多层膜中高(ZrO2)、低(SiO2)折射率材料膜厚组合周期数的方法,研究了沉积在熔石英和BK7玻璃基底上多层膜中残余应力的变化。
3) SiO2/ZrO2 gel layer
SiO2/ZrO2凝胶膜
1.
In this paper,single glossy PMMA layer with the thickness of 13μm and UV photosensitive SiO2/ZrO2 gel layer with 1.
76μm的SiO2/ZrO2凝胶膜,研究了SiO2/ZrO2凝胶膜的感光性及紫外光照对两种薄膜折射率的影响。
4) Two-layer SiO2/ZrO2 films
SiO2/ZrO2双层膜
5) ZrO_2 thin film
ZrO2薄膜
1.
Influence on the microstructure of ZrO_2 thin films deposited at different O_2 partial pressure and substrate temperature was analysed by X-ray diffraction (XRD) technique, the surface roughness and laser damage threshold also were measured.
采用X射线衍射(XRD)技术分析了不同充氧条件和沉积温度对ZrO2薄膜组成结构的影响,并对不同工艺下制备的薄膜的表面粗糙度和激光损伤阈值进行了测量。
6) ZrO2 film
ZrO2薄膜
1.
An anionic surfactant, 4-dodecylbenzenesulfonic acid (DBS-H), has been used to prepare ZrO2 films as the template at the air-water interface.
采用模板——十二烷基苯磺酸(DBS-H)在空气-水界面组装ZrO2薄膜,研究了DBS-H在ZrO2自组装薄膜中的水溶性、化学稳定性、热稳定性和光化学稳定性。
2.
Three anionic surfactants, sodium dodecyl sulfate (SDS), 4-dodecylbenzenesulfonic acid (DBS-H) and sodium 4-dodecylbenzenesulfonate (DBS-Na) have been readily employed to prepare ZrO2 films at the air-water interface.
采用三种阴离子表面活性剂:十二烷基磺酸钠(SDS),十二烷基苯磺酸钠(DBS-Na),十二烷基苯磺酸(DBS-H)作模板,在空气-水界面上组装ZrO2薄膜。
3.
Electrical properties testing shows the equivalent oxide thickness of 10 nm-thick ZrO2 film is 3.
采用脉冲激光沉积方法在Si衬底上沉积了ZrO2栅介质薄膜,X射线衍射分析表明该薄膜经过450℃退火后低介电界面层得到抑制,仍然保持非晶状态;电学测试显示10 nm厚ZrO2薄膜的等效厚度为3。
补充资料：Baddeleyite(ZrO2)
CAS：12036-23-6
分子式：ZrO2
分子质量：123.22
中文名称：斜锆石
英文名称：baddeleyite；Baddeleyite(ZrO2)；caldasite
分子式：ZrO2
分子质量：123.22
中文名称：斜锆石
英文名称：baddeleyite；Baddeleyite(ZrO2)；caldasite
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条