2) Fe-N-O thin films
Fe-N-O薄膜
3) Mo-Fe-Si-O membrane
Mo-Fe-Si-O薄膜
1.
The Fe-Si-O membrane(on the microscope slide) and Mo-Fe-Si-O membrane (on the α-Al2O3 support) were obtained by diploid-circle- dipping-coating.
考察了制备工艺条件对Fe－Si－O成膜的影响，采用DTA、XRD和SEM等技术研究了热处理条件对Mo－Fe－Si－O薄膜结构的影响。
4) Fe-Ni film
Fe-Ni薄膜
5) Fe/Si thin film
Fe/Si薄膜
6) Fe-N thin films
Fe-N薄膜
1.
Effects of substrate temperature on structure,morphology and magnetic properties of Fe-N thin films;
衬底温度对Fe-N薄膜结构、形貌及磁性能的影响
2.
Effect of bias voltage on the structure and properties of Fe-N thin films prepared by direction current magnetron sputtering;
偏压对直流磁控溅射Fe-N薄膜结构及性能的影响
3.
The Fe-N thin films were deposited on single crystal NaCl(100) and glass substrates via DC magnetron sputtering with an Ar/N2 gas mixture(N2/(Ar+N2)=10%) as the discharging gas.
采用直流磁控溅射方法,以Ar/N2为放电气体(N2/(Ar+N2)=10%),在玻璃和NaCl(100)单晶片上分别沉积获得Fe-N薄膜样品。
补充资料：[3-(aminosulfonyl)-4-chloro-N-(2.3-dihydro-2-methyl-1H-indol-1-yl)benzamide]
分子式：C16H16ClN3O3S
分子量：365.5
CAS号：26807-65-8
性质：暂无
制备方法：暂无
用途：用于轻、中度原发性高血压。
分子量：365.5
CAS号：26807-65-8
性质：暂无
制备方法：暂无
用途：用于轻、中度原发性高血压。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条