1) HfON protective films
氮氧化铪保护膜
2) HfOxNy thin films
氮氧化铪薄膜
1.
HfOxNy thin films were deposited by radio frequency reactive magnetron sputtering onto multi-spectral ZnS substrates at different oxygen partial pressure.
用磁控反应溅射法在不同氧分压下制备了氮氧化铪薄膜。
2.
HfOxNy thin films were deposited by RF reactive magnetron sputtering on multi-spectral ZnS substrates at different oxygen partial pressure.
采用射频磁控反应溅射法在不同氧分压条件下制备了氮氧化铪薄膜,薄膜沉积过程在氧气、氮气和氩气的混合气氛中进行,所用衬底为多光谱硫化锌材料。
3) oxide-protective film
氧化保护膜
4) oxide film protection
氧化膜保护
5) HfTiON
氮化氧化钛铪
6) alumina protective layer
氧化铝保护膜
1.
Based on the theory of Kubelka Munk, the optical properties of phosphor alumina protective layer of compact fluorescent lamp is discussed, and the effect of these two layers' thickness on the lumen output of lamps is presented.
本文以 Kubelka- Munk理论为基础 ,对紧凑型荧光灯荧光粉层 -氧化铝保护膜层的光学特性进行了分析。
补充资料:氧化铪
CAS:12055-23-1
分子式:HfO2
分子质量:210.48
熔点:2812℃
中文名称:氧化铪
英文名称:hafnium oxide;hafnium oxide
分子式:HfO2
分子质量:210.48
熔点:2812℃
中文名称:氧化铪
英文名称:hafnium oxide;hafnium oxide
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
参考词条