1) Coelectrodeposition/stripping protocol
电化学共沉积/溶出(CS)法
2) CSD
化学溶液沉积法
1.
75Ti3O12(BLT) thin films have been prepared by chemical solution deposition(CSD).
采用化学溶液沉积法在p-Si(100)衬底上制备了LaNiO3(LNO)下电极和Bi3。
2.
The Bi_2Ti_2O_7 thin film with strong (111) orientation was successfully prepared by chemical solution deposition (CSD) technique on n－ Si (100) using bismuth nitrate and titanium butoxide as starting materials.
采用化学溶液沉积法，以硝酸铋和钛酸四丁酯为原料成功地制备了 Bi_2Ti_2O_7介质膜。
3.
75)Ti_3O_(12) ((M=Nd,Al,In)) thin films have been prepared on LaNiO3 (LNO)/Si and quartz by chemical solution deposition (CSD), respectively.
采用化学溶液沉积法分别在LaNiO3(LNO)/Si和石英衬底上制备了Bi_(3。
3) Chemical solution deposition
化学溶液沉积法
1.
Preparation of YBa_2Cu_3O_7 thin films by chemical solution deposition;
化学溶液沉积法制备YBa_2Cu_3O_7超导薄膜
2.
Study on Preparation of LiMn_2O_4 Film Electrode by Chemical Solution Deposition Method;
化学溶液沉积法制备LiMn_2O_4薄膜电极的研究
3.
LaNiO3(LNO) thin films were prepared on(100)Si,SiO2/Si,(100)Al2O3,(100)MgO,(100)SrTiO3(STO),(100)ZrO2 substrates by chemical solution deposition.
采用化学溶液沉积法在(100)Si,SiO2/Si,(100)Al2O3,(100)MgO,(100)SrTiO3(STO),(100)ZrO2等衬底上制备了LaNiO3(LNO)薄膜,研究了热处理温度对薄膜结构和电性能的影响。
4) chemical solution deposition method
化学溶液沉积法
1.
The nanocrystalline CdSe film electrode was prepared by chemical solution deposition method,and characterized with TEM and EDS.
利用化学溶液沉积法制备了CdSe纳晶薄膜,并用透射电子显微镜和扫描电子显微镜的EDS对其形貌和化学组成进行了表征。
2.
Zn~(2+)/chitosan composite film had been prepared by adding Zn(Ac)_2·2H_2O into chitosan solu- tion and ZnO was grown on Zn~(2+)/chitosan composite film through chemical solution deposition method.
通过在壳聚糖(CS)溶液里掺入乙酸锌制备了Zn~(2+)/CS复合膜,并采用化学溶液沉积法在Zn~(2+)/CS复合膜上生长了氧化锌(ZnO)。
5) electrochemical co-deposition
电化学共沉积
1.
An electrochemical co-deposition technique has been developed to prepare a hydroxyapatite(HA)/collagen composite coating on Ti substrate.
借助体外细胞的培养实验观察种植于不同材料表面的细胞贴壁及生长形态,显示电化学共沉积的复合涂层具有比纯HA或纯钛表面更好的生物相容性。
2.
An electrochemical co-deposition method was developed to successfully prepare the hybrid bioceramic coating of hydroxyapatite (HAP)/ Poly (vinyl acetate) on the surface of Ti alloy.
应用电化学共沉积技术制备HAP 聚乙酸乙烯酯杂化陶瓷膜层 ,XRD、XPS、SEM表征结果指出 ,由电化学共沉积制备的复合膜层中无机相以HAP为主 ,有机物含量达 4% 。
6) electrochemical deposition-dissolution
电沉积-溶出
补充资料：电解沉积(见水溶液电解)
电解沉积(见水溶液电解)
electrowinning
d lanJ一e ehenji电解沉积(eleetrowinning)见水溶液电解。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条