1) chemical solution deposition
化学溶液沉积
1.
ZnO nanorods were grown on ITO conducting glass by the chemical solution deposition method (CBD) at a low temperature(90 ℃).
在低温条件下,利用化学溶液沉积法(CBD)成功在ITO导电玻璃衬底上生长出近一维ZnO纳米棒。
2.
On the one hand, in order to study the effects of film thickness on microstructures and electrical properties of BNT thin films, BNT films with different thicknesses were fabricated by chemical solution deposition (CSD).
一方面,用化学溶液沉积(CSD)法制备了不同薄膜厚度的BNT铁电薄膜,研究了薄膜厚度对BNT薄膜微观结构和电学性能的影响;另一方面,用静电纺丝法制备了BNT纳米纤维,并研究了BNT纳米纤维的微观结构和电学性能;同时,利用朗道理论对BNT纳米纤维的居里温度和电学性能进行了研究。
3.
YBCO superconducting film is fabricated on the single crystal LaAlO_3 substrates using non-fluorine chemical solution deposition.
本学位论文在LaAlO_3单晶基底上采用无氟化学溶液沉积法制备了YBCO超导薄膜。
2) CSD
化学溶液沉积
1.
(La_xBi_(1-x))_2Ti_2O_7(BLT)and Bi_2Ti_2O_7(BTO)films were prepared on Si(100) substrates by chemical solution deposition(CSD).
采用化学溶液沉积(CSD)工艺在Si(100)衬底上制备了Bi2Ti2O7(BTO(和(LaxBi1-x)2Ti2O7(BLT(铁电薄膜,薄膜的X射线衍射(XRD)结果显示其具有较好的结晶性,运用X射线光电能谱仪(XPS)对薄膜的结构进行了研究,分析结果表明,薄膜中氧空位的出现影响了其相的稳定性,通过掺La可以改善其性能。
3) CSD
化学溶液沉积法
1.
75Ti3O12(BLT) thin films have been prepared by chemical solution deposition(CSD).
采用化学溶液沉积法在p-Si(100)衬底上制备了LaNiO3(LNO)下电极和Bi3。
2.
The Bi_2Ti_2O_7 thin film with strong (111) orientation was successfully prepared by chemical solution deposition (CSD) technique on n－ Si (100) using bismuth nitrate and titanium butoxide as starting materials.
采用化学溶液沉积法，以硝酸铋和钛酸四丁酯为原料成功地制备了 Bi_2Ti_2O_7介质膜。
3.
75)Ti_3O_(12) ((M=Nd,Al,In)) thin films have been prepared on LaNiO3 (LNO)/Si and quartz by chemical solution deposition (CSD), respectively.
采用化学溶液沉积法分别在LaNiO3(LNO)/Si和石英衬底上制备了Bi_(3。
4) Chemical solution deposition
化学溶液沉积法
1.
Preparation of YBa_2Cu_3O_7 thin films by chemical solution deposition;
化学溶液沉积法制备YBa_2Cu_3O_7超导薄膜
2.
Study on Preparation of LiMn_2O_4 Film Electrode by Chemical Solution Deposition Method;
化学溶液沉积法制备LiMn_2O_4薄膜电极的研究
3.
LaNiO3(LNO) thin films were prepared on(100)Si,SiO2/Si,(100)Al2O3,(100)MgO,(100)SrTiO3(STO),(100)ZrO2 substrates by chemical solution deposition.
采用化学溶液沉积法在(100)Si,SiO2/Si,(100)Al2O3,(100)MgO,(100)SrTiO3(STO),(100)ZrO2等衬底上制备了LaNiO3(LNO)薄膜,研究了热处理温度对薄膜结构和电性能的影响。
5) chemical solution deposition(CBD)
化学溶液沉积(CBD)
6) chemical solution deposition method
化学溶液沉积法
1.
The nanocrystalline CdSe film electrode was prepared by chemical solution deposition method,and characterized with TEM and EDS.
利用化学溶液沉积法制备了CdSe纳晶薄膜,并用透射电子显微镜和扫描电子显微镜的EDS对其形貌和化学组成进行了表征。
2.
Zn~(2+)/chitosan composite film had been prepared by adding Zn(Ac)_2·2H_2O into chitosan solu- tion and ZnO was grown on Zn~(2+)/chitosan composite film through chemical solution deposition method.
通过在壳聚糖(CS)溶液里掺入乙酸锌制备了Zn~(2+)/CS复合膜,并采用化学溶液沉积法在Zn~(2+)/CS复合膜上生长了氧化锌(ZnO)。
补充资料：电解沉积(见水溶液电解)
电解沉积(见水溶液电解)
electrowinning
d lanJ一e ehenji电解沉积(eleetrowinning)见水溶液电解。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条